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High Photosensitivity Two-Photon Photoresists for Large Area Surface Microstructuring

Published online by Cambridge University Press:  19 September 2011

Robert J. DeVoe ,
Tzu-Chen Lee ,
Jeremy K. Larsen ,
David A. Ender ,
Jennifer J. Sahlin ,
Craig R. Sykora ,
Cheryl A. Patnaude ,
Matthew R. Atkinson ,
Michael E. Griffin  and
Brian J. Gates
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Robert J. DeVoe
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
Tzu-Chen Lee
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
Jeremy K. Larsen
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
David A. Ender
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
Jennifer J. Sahlin
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
Craig R. Sykora
Affiliation:
Electronic Markets and Materials Lab, 3M Co., St. Paul, MN 55144, U.S.A.
Cheryl A. Patnaude
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
Matthew R. Atkinson
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
Michael E. Griffin
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
Brian J. Gates
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
David H. Redinger
Affiliation:
Corporate Research Labs, 3M Co., 201-3N-05 3M Center, St. Paul, MN 55144, U.S.A.
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Abstract

Two-Photon initiated polymerization (TPIP) has shown great promise for fabrication of complex micro- and nano-structures. The method has been used to fabricate such structures over small areas (< 1 mm2) because of slow fabrication speeds and resulting long fabrication times. In order for TPIP to reach practical application in a commercial setting fabrication times need to be reduced by orders of magnitude. We report results on a highly photosensitive initiation system for photoresists based on free radical and cationic polymerization, where photosensitivity is increased 102- to 103-fold compared to previously reported photoinitiation systems. Threshold writing speeds are determined for critical exposure conditions, including laser power, type and concentration of photoinitiation system, and photoresist type. Surface roughness, a critical parameter in applications such as optics and microfluidics, for example, is also used to determine threshold writing speed. The utility of the approach is demonstrated by making a cell phone keypad light guide from a microreplication tool fabricated using the highly photosensitive photoresist.

Keywords

laser-induced reactionmicrostructurechemical reaction
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1365: Symposium TT – Laser-Material Interactions at Micro/Nanoscales , 2011 , mrss11-1365-tt09-14
Copyright
Copyright © Materials Research Society 2011

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References

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