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Gas Phase and Gas Surface Kinetics of Transient Silicoin Hydride Species

Published online by Cambridge University Press:  22 February 2011

Joseph M. Jasinski
Joseph M. Jasinski*
Affiliation:
IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights NY 10598
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Abstract

This paper presents a summary of the current state of our understanding of the absolute reactivity of transient silicon hydride species, such as SiH, SiH2 and SiH3 in the gas phase and at the surface of thin films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 11
Copyright
Copyright © Materials Research Society 1994

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