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Field Emission Properties of Disordered and Partially Ordered Nano Clustered Carbon Films

Published online by Cambridge University Press:  10 February 2011

B. F. Coll
Affiliation:
Motorola FPDD, 7700 S. River Parkway, Tempe, AZ 85284
J. E. Jaskie
Affiliation:
Motorola FPDD, 7700 S. River Parkway, Tempe, AZ 85284
J. L. Markham
Affiliation:
Motorola FPDD, 7700 S. River Parkway, Tempe, AZ 85284
E. P. Menu
Affiliation:
Motorola FPDD, 7700 S. River Parkway, Tempe, AZ 85284
A. A. Talin
Affiliation:
Motorola FPDD, 7700 S. River Parkway, Tempe, AZ 85284
P. Von Allmen
Affiliation:
Motorola FPDD, 7700 S. River Parkway, Tempe, AZ 85284
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Abstract

The fabrication of an efficient cold cathode emitter from carbon is based on a combination of material properties, which must be carefully tailored during deposition. We present the electron emission characteristics of several carbon films deposited by cathodic arc evaporation, and their correlation with the chemical composition, microtexture and microstructure of the films. The emission threshold field voltage, emission site density, uniformity and stability of both tetrahedral amorphous carbon, nitrogen doped carbon and nanoclustered carbon films will be reviewed. We will also address issues related to the deposition method, such as substrate temperature, defect density and scalability, in connection with requirements for the fabrication of field emission displays.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

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