Hostname: page-component-cd9895bd7-7cvxr Total loading time: 0 Render date: 2024-12-26T16:47:08.954Z Has data issue: false hasContentIssue false
  • English
  • Français

Fiber-optics Low-coherence Integrated Metrology for In-Situ Non-contact Characterization of Wafer Curvature for Wafers Having Non-uniform Substrate and Thin Film Thickness

Published online by Cambridge University Press:  01 February 2011

Wojciech J. Walecki ,
Alexander Pravdivtsev ,
Kevin Lai ,
Manuel Santos II ,
Georgy Mikhaylov ,
Mihail Mihaylov  and
Ann Koo
Wojciech J. Walecki
Affiliation:
Frontier Semiconductor, 1631 North 1st Street, San Jose CA 95112
Alexander Pravdivtsev
Affiliation:
Frontier Semiconductor, 1631 North 1st Street, San Jose CA 95112
Kevin Lai
Affiliation:
Frontier Semiconductor, 1631 North 1st Street, San Jose CA 95112
Manuel Santos II
Affiliation:
Frontier Semiconductor, 1631 North 1st Street, San Jose CA 95112
Georgy Mikhaylov
Affiliation:
Frontier Semiconductor, 1631 North 1st Street, San Jose CA 95112
Mihail Mihaylov
Affiliation:
Frontier Semiconductor, 1631 North 1st Street, San Jose CA 95112
Ann Koo
Affiliation:
Frontier Semiconductor, 1631 North 1st Street, San Jose CA 95112
Get access

Abstract

Abstract. We propose novel stress metrology technique for measurement of local values stress tensor components in the coated wafers. New metrology is based on fiber-optic low coherence interferometry and can be applied to study stress not only in semicondiuctor wafers but in wide variety applications spanning from semiconductor to construction industry where measurements of plates covered by thin film encountered in flat panel displayes, solar cells, modern windows.

Keywords

Thin-Film MetrologyDiagnosticsIn-SituReal-Time Control and MonitoringThin Film Stress MetrologyInterferometryPACS: 68.60.-p68.90.+g83.85.St95.75.Kk
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 875: Symposium O – Thin Films - Stresses and Mechanical Properties XI , 2005 , O9.4
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Huang, D., Swanson, E. A., Lin, C. P., Schuman, J. S., Stinson, W. G., Chang, W., Hee, M. R., Flotte, T., Gregory, K., Puliafito, C. A., Fujimoto, J. G., “Optical coherence tomography,” Science 254, 1178–1181 (1991).Google Scholar
2. Walecki, W., “Non-Contact Fast Wafer Metrology for Ultra-Thin Patterned Wafers Mounted on Grinding Dicing Tapes”, SEMI® Technology Symposium: International Electronics Manufacturing Technology IEMT), San Jose, July 16, 2004.Google Scholar
3. Walecki, W.J., Lu, R., Lee, J., Watman, M., Lau, S.H., and Koo, A., “Novel Non-contact Wafer Mapping Metrologies for Thin and Ultrathin Chip Manufacturing Applications”, 3rd International Workshop on Semiconductor Devices – Manufacturing and Applications, Munich, Germany, November 25, 2002.Google Scholar
4. Walecki, W. J., Souchkov, V., Lai, K., Van, P., Santos, M., Pravdivtsev, A., Lau, S. H., and Koo, A., “Novel Noncontact Thickness Metrology for Partially Transparent and Nontransparent Wafers for Backend Semiconductor Manufacturing” in Progress in Compound Semiconductor Materials IV—Electronic and Optoelectronic Applications, edited by Brown, G.J., Manasreh, M.O., Gmachl, C., Biefeld, R.M., Unterrainer, K. (Mater. Res. Soc. Symp. Proc. 829, Warrendale, PA, 2004), B9.31.Google Scholar
5. Walecki, W. J., Lai, K., Souchkov, V., Van, P., Lau, SH, and Koo, A., “Novel noncontact thickness metrology for backend manufacturing of wide bandgap light emitting devices”, phys. stat. sol. (c) 2, No. 3, 984–989 (2005).Google Scholar
6. Walecki, W., Wei, F., Van, P., Lai, K., Lee, T., Lau, SH, and Koo, A., “Novel Low Coherence Metrology for Nondestructive Characterization of High Aspect Ratio Micro-fabricated and Micro-machined Structures” Reliability, Testing and Characterization MEMS/MOEMS III, edited by Tanner, D. M. and Ramesham, R., Proc. SPIE 5343, 55 (2003).Google Scholar
7. Walecki, , Low Coherence Interferometry Based Metrologies for MEMS Manufacturing, SEMI Technology Symposium: Innovations in Semiconductor Manufacturing (STS: ISM), July 13, San Francisco, 2004.Google Scholar
8. Walecki, W., Wei, F., Van, P., Lai, K., Lee, T., Souchkov, V., Lau, S.H., and Koo, A. “Low Coherence Interferometric Metrology for Ultra-Thin MEMs Structures”, in Nanoengineered Assemblies and Advanced Micro/Nanosystems, edited by Taylor, David P., Liu, Jun, McIlroy, David, Merhari, Lhadi, Pendry, J.B., Borenstein, Jeffrey T., Grodzinski, Piotr, Lee, Luke P., and Wang, Zhong Lin (Mater. Res. Soc. Symp. Proc. 820, Warrendale, PA, 2004), 08.8.Google Scholar
9. Walecki, Wojciech J., Wei, Frank, Van, Phuc, Lai, Kevin, Lee, Tim, Lau, SH, and Koo, Ann, “Novel Low Coherence Metrology for Nondestructive Characterization of High Aspect Ratio Micro-fabricated and Micro-machined Structures”, Reliability, Testing, and Characterisation of MEMS/MOEMS III, edited by Tanner, Danelle M., Ramesham, Rejeshuni, Proceedings of SPIE Vol. 5343 p. 55–62 (SPIE, Bellingham, WA, 2004).Google Scholar
10. Walecki, W. J., Souchkov, V., Lai, K., Wong, T., Azfar, T., Tan, Y. T., Van, P., Lau, S. H., and Koo, A., “Low-coherence interferometric absolute distance gauge for study MEMs structures” in Reliability, Testing and Characterization MEMS/MOEMS IV, edited by Tanner, D. M. and Ramesham, R., Proc. SPIE 5716, 23 (2005).Google Scholar
11. Rosakis, A. J., Singh, R., Kolawa, E. and Moore, N. Jr, “Coherent Gradient Sensing Method and System for Measuring Surface Curvatures”, Issued 2000, US Patent # 6,031,611 2.Google Scholar
12. Roll, K., Journal of Applied Physics, vol. 47, No. 7, p. 3224 (1976).Google Scholar
13. Landau, L. D. and Lifschitz, E. M., “Theory of Elasticity” (Pergamon, New York 1970).Google Scholar
14. Stoney, G. G., Proc. Roy. Soc, London, Ser A 82, 172, (1909).Google Scholar
15. Shaffer, P.T.B., Appl. Opt. 10 (1971), 1034–1036.Google Scholar
16. Born, M. and Wolf, E. “The Diffraction Theory of Aberrations.” Ch. 9 in Principles of Optics: Electromagnetic Theory of Propagation, Interference, and Diffraction of Light, 6th ed. New York: Pergamon Press, pp. 459–490, 1989 Google Scholar
17. Weisstein, Eric W.. “Zernike Polynomial.” From MathWorld--A Wolfram Web Resource. http://mathworld.wolfram.com/ZernikePolynomial.htmlGoogle Scholar