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Far-Infrared Spectroscopic Study of Diamond Films

Published online by Cambridge University Press:  26 February 2011

A. J. Gatesman ,
R. H. Giles ,
G. C. Phillips ,
J. Waldman ,
L. P. Bourget  and
R. Post
A. J. Gatesman
Affiliation:
University of Lowell Research Foundation, Lowell, MA 01852
R. H. Giles
Affiliation:
University of Lowell Research Foundation, Lowell, MA 01852
G. C. Phillips
Affiliation:
University of Lowell Research Foundation, Lowell, MA 01852
J. Waldman
Affiliation:
University of Lowell Research Foundation, Lowell, MA 01852
L. P. Bourget
Affiliation:
Applied Science and Technology, Inc., Woburn, MA 01801
R. Post
Affiliation:
Applied Science and Technology, Inc., Woburn, MA 01801
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Abstract

High quality polycrystalline diamond films grown on Si substrates by microwave plasma enhanced chemical vapor deposition were characterized in a far-infrared spectroscopic study. The spectroscopic transmissivity data were used to derive a model for the complex refractive index (n – ik) as a function of wavelength in the 10 to 200 cm−1 frequency regime. Similar transmissivity and reflectivity data from samples of varying thickness were used to validate this model. The continuum of measured transmissivity and reflectivity data from 10 to 200 cm−1 were shown to be in excellent agreement with the values calculated from the refractive index model. The films were shown to have low loss in this frequency regime.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 162: Symposium F – Diamond, Silicon Carbide and Related Wide Bandgap Semiconductors , 1989 , 285
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1 Post, R. S., Smith, D. K. and Conrad, J. R., 9th International Conference on Vacuum Metallurgy, San Diego, CA April 11–15, 1988 paper F3-1Google Scholar
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3. Azzam, R. M. A. and Bashara, N. M., Ellipsometr and Polarized Light, (North-Holland 1979) Section 4.3Google Scholar