Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-24T14:33:37.027Z Has data issue: false hasContentIssue false
  • English
  • Français

Fabrication of Nanostructured Thin Films Using Porous Alumina Templates

Published online by Cambridge University Press:  01 February 2011

Aijun Yin ,
Jin Ho Kim  and
Jimmy Xu
Aijun Yin
Affiliation:
[email protected], Brown University, Division of ENgineering, 182 Hope Street, Box D, Providence, RI, 02912, United States, 401-863-2447, 401-863-9028
Jin Ho Kim
Affiliation:
[email protected], Brown University, Engineering, 184 Hope Street, Box D, Providence, RI, 02912, United States
Jimmy Xu
Affiliation:
[email protected], Brown University, Engineering, 184 Hope Street, Box D, Providence, RI, 02912, United States
Get access

Abstract

We demonstrate a method for fabricating a variety of nanostructured metallic thin films by using one simple approach based on the use of anodic aluminum oxide (AAO) membrane as masking template. Highly-ordered large-area metallic nanopore- or nanotip-arrays (e.g., Ni, Ag, Au), with various sizes and shapes, were deposited onto AAO membranes through e-beam evaporation. Free standing nano-patterned metallic films were obtained after chemically removing the template and characterized using scanning electron microscopy and electrochemical methods. The nanostructured films will find use in a number of applications, such as plasmonics, electrochemical and biomedical analysis, and catalysis.

Keywords

thin filmnanostructureion-beam assisted deposition
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 951: Symposium E – Nanofunctional Materials, Nanostructures and Novel Devices for Biological and Chemical Detection , 2006 , 0951-E09-15
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Yablonovitch, E., Gmitter, T. J., Meada, R. D., Rappe, A. M., Brommer, K. D., and Joannopoulos, J. D., Phys. Rev. Lett. 67, 3380 (1991)Google Scholar
2. Imada, M., Noda, S., Chutinan, A., and Tokuda, T., Appl. Phys. Lett. 75, 316 (1999)Google Scholar
3. Dicky, E. C., Varghese, O. K., Ong, K. G., Gong, D., Panlose, M., and Grimes, C. A., Sensor 2, 91 (2002)Google Scholar
4. Renault, J. P., Bernard, A., Juncker, D., Michel, B., Bosshard, H. R., and Delamarche, E., Angew. Chem. Int. Ed. 41, 2320 (2002)Google Scholar
5. Matsushita, S. I., Miwa, T., Tryk, D. A., and Fujishima, A., Langmuir 14, 6441 (1998)Google Scholar
6. Castano, F. J., Nielsch, K., Ross, C. A., Pobison, J. W. A., and Krishnan, R., Appl. Phys. Lett. 85, 2872 (2004 (AAO)Google Scholar
7. Stewart, M. D. Jr, Long, Z., Valles, J. M. Jr, Yin, A. J., and Xu, J. M., Phys. Rev. B 73, 092509 (2006)Google Scholar
8. Tessier, P. M., Velev, O. D., Kalambur, A. T., Lenhoff, A. M., Rabolt, J. F., and Kaler, E. W., Adv. Mater. 13, 396 (2001)Google Scholar
9. Tatsuma, T., Ikezawa, A., Ohko, Y., Miwa, T., Matsue, T. and Fujishima, A., Adv. Mater. 12, 643 (2000)Google Scholar
10. Sandison, M. E., and Cooper, J. M., Lab Chip 6, 1020 (2006)Google Scholar
11. Knaack, S. A., Eddington, J., Leonard, Q., Cerrina, F., and Onellion, M., Appl. Phys. Lett. 84, 3388 (2004)Google Scholar
12. Ebbesen, T. W., Lezec, H. J., Ghaemi, H. F., Thio, T., and Wolff, P. A., Nature 391, 667 (1998)Google Scholar
13. Xia, Y., Rogers, J., Paul, K. E., and Whitesides, G. M., Chem. Rev. 99, 1823 (1999)Google Scholar
14. Stenzel-Rosenbaum, M. H., Davis, T. P., Fane, A. G., and Chen, V., Angew. Chem. Int. Ed. 40, 3428 (2001)Google Scholar
15. Sun, F., Cai, W., Li, Y., Cao, B., Lei, Y., and Zhang, L., Adv. Funct. Mater. 14, 283 (2004)Google Scholar
16. Masuda, H., and Fukuda, K., Science 268, 1466 (1995)Google Scholar
17. Liang, J., Chik, H., Yin, A., Xu, J., J. Appl. Phys. 91, 2544 (2002)Google Scholar
18. Crouse, D., Lo, Y. –H., Miller, A. E., Crouse, M., Appl. Phys. Lett. 76, 49 (2000)Google Scholar
19. Losic, D., Shapter, J. G., Mitchell, J. G. and Voelcker, N. H., Nanotechnology 16, 2275 (2005)Google Scholar
20. Pavenayotin, N., Stewart, M. D. Jr, Valles, J. M. Jr, Yin, A. J., and Xu, J. M., Appl. Phys. Lett. 87, 193111 (2005)Google Scholar
21. Guo, Y., Zhang, H., Hu, J., Wan, L., and Bai, C., Thin Solid Films 484, 341 (2005)Google Scholar
22. Lee, W., Alexe, M., Nielsch, K., and Gosele, U., Chem. Mater. 17, 3325 (2005)Google Scholar
23. Yanagishita, T., Nishio, K., and Masuda, H., Adv. Mater. 17, 2241 (2005)Google Scholar
24. Ma, W., Harnagea, C., Hesse, D., and Gosele, U., Appl. Phys. Lett. 83, 3770 (2003)Google Scholar
25. Goh, C., Coakley, K. M., and McGehee, M. D., Nano Lett. 5, 1545 (2005)Google Scholar