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Fabrication of Graphene Network via Nanoimprint Lithography

Published online by Cambridge University Press:  30 March 2012

Liumin Zou ,
Keita Konishi ,
Morihisa Hoga  and
Kanji Yoh
Liumin Zou
Affiliation:
Research Center for Integrated Quantum Electronics, Hokkaido University, Sapporo, 060-8628, Japan
Keita Konishi
Affiliation:
Research Center for Integrated Quantum Electronics, Hokkaido University, Sapporo, 060-8628, Japan
Morihisa Hoga
Affiliation:
Dai Nippon Printing Co. Ltd., Japan
Kanji Yoh
Affiliation:
Research Center for Integrated Quantum Electronics, Hokkaido University, Sapporo, 060-8628, Japan
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Abstract

We have investigated the hexagonal graphene network (GNW) structure for the possible opening of the graphene bandgap. We have fabricated GNW by nanoimprint lithography and compared with previous GNW results based on electron beam (EB) lithography. Hall-bar device with GNW was successfully fabricated using nanoimprint lithography and verified mobility of 1,220 cm2 V-1 s-1 with graphene nanoribbon (GNR) width of 40 nm. The mobility improvement compared with GNW by EB lithography indicates the effectiveness of nanoimprint method for the hexagonal GNW approach.

Keywords

Cfilmnanoscale
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1407: Symposium AA – Carbon Nanotubes, Graphene and Related Nanostructures , 2012 , mrsf11-1407-aa05-81
Copyright
Copyright © Materials Research Society 2012

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References

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