Published online by Cambridge University Press: 26 February 2011
a-Si1−xCx:H superlattice structures were fabricated by photo-CVD and glow discharge deposition. The compositional abruptness of the heterojunction has been confirmed by X-ray diffraction and Auger electron spectroscopy. The optical bandgap of amorphous silicon-based superlattices increases as the well layer thickness decreases. The existence of quantized levels in a-Si:H wells is demonstrated by the observation of resonant tunneling current through the three-barrier two-well structure.