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Epitaxial Pb(Zr0.40Ti0.60)O3/SrRuO3 and PbTiO3/SrRuO3 Multilayer Thin Films Prepared by MOCVD and Rf Sputtering

Published online by Cambridge University Press:  15 February 2011

C.M. Foster ,
R. Csencsits ,
P.M. Baldo ,
G.R. Bai ,
Z. Li ,
L.E. Rehn ,
L.A. Wills ,
R. Hiskes ,
P. Dimos  and
M.B. Sinclair
C.M. Foster
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Avenue, Argonne, IL 60439
R. Csencsits
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Avenue, Argonne, IL 60439
P.M. Baldo
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Avenue, Argonne, IL 60439
G.R. Bai
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Avenue, Argonne, IL 60439
Z. Li
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Avenue, Argonne, IL 60439
L.E. Rehn
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Avenue, Argonne, IL 60439
L.A. Wills
Affiliation:
Hewlett Packard Laboratories, Hewlett-Packard Company, 3500 Deer Creek Road, Palo Alto, CA 94304
R. Hiskes
Affiliation:
Hewlett Packard Laboratories, Hewlett-Packard Company, 3500 Deer Creek Road, Palo Alto, CA 94304
P. Dimos
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
M.B. Sinclair
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
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Abstract

Epitaxial SrRuO3 thin films were deposited by RF sputtering on SrTiO3 or MgO substrates for use as underlying electrodes. On these conductive substrates, epitaxial Pb(Zr0.35Ti0.65)O3 (PZT) and PbTiO3 (PT) thin films were deposited by metalorganic chemical vapor deposition (MOCVD). X-ray diffraction (XRD), RBS channeling (RBS), transmission electron microscopy (TEM) and optical waveguiding were used to characterize the phase, microstructure, defect structure, refractive index, and film thickness of the deposited films. The PZT and PT films were epitaxial and c-axis oriented. 90° domains, interfacial misfit dislocations and threading dislocations were the primary structural defects, and the films showed a 70% RBS channelling reduction. Hysteresis and dielectric measurements of epitaxial PZT ferroelectric capacitor structures formed using evaporated Ag or ITO glass top electrode showed: a remanent polarization of 46.2 μC/cm2 a coercive field of 54.9 kV/cm, a dielectric constant of 410, a bipolar resistivity of ∼5.8×109 ω-cm at a field of 275 kV/cm, and a breakdown strength of >400 kV/cm.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 361: Symposium I2 – Ferroelectric Thin Films IV , 1994 , 307
Copyright
Copyright © Materials Research Society 1995

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References

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