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Epitaxial growth of Matched Metallic ErP0.6 As0.4 layers on GaAs

Published online by Cambridge University Press:  28 February 2011

A. Guivarc'h
Affiliation:
Centre National d’Etudes des Télécommunications LAB/OCM BP 40 - 22301 LANNION (FRANCE)
A. Le Corre
Affiliation:
Centre National d’Etudes des Télécommunications LAB/OCM BP 40 - 22301 LANNION (FRANCE)
J. Caulet
Affiliation:
Centre National d’Etudes des Télécommunications LAB/OCM BP 40 - 22301 LANNION (FRANCE)
B. Guenais
Affiliation:
Centre National d’Etudes des Télécommunications LAB/OCM BP 40 - 22301 LANNION (FRANCE)
M. Minier
Affiliation:
Centre National d’Etudes des Télécommunications LAB/OCM BP 40 - 22301 LANNION (FRANCE)
G. Ropars
Affiliation:
Centre National d’Etudes des Télécommunications LAB/OCM BP 40 - 22301 LANNION (FRANCE)
P.A. Badoz
Affiliation:
Centre National d’Etudes des Télécommunications CNS/RPT BP 98 - 38243 MEYLAN CEDEX (FRANCE)
J.Y. Duboz
Affiliation:
Centre National d’Etudes des Télécommunications CNS/RPT BP 98 - 38243 MEYLAN CEDEX (FRANCE)
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Abstract

Successful growth of (001 )ErP0.6As0.4 single crystal film on (001) GaAs has been demonstrated. The epitaxial metallic layers reproducibly showed lattice mismatch below 5 10-4. This is, to our knowledge, the first report of a stable, epitaxial and lattice-matched metal/compound semiconductor heterostructure. The ErP0.6As0.4/n-GaAs diodes yielded excellent I-V characteristics with an ideality factor of 1.1 and barrier height of 0.88 eV. For a 240 A-thick film, metallic behavior was observed with resistivities of 25 and 86 µΩcm at 1.5 K and room temperature, respectively. As the other Er compounds ErP, ErAs, ErSb and ErSi2, ErP0.6As0.4 presents an abrupt drop in resistivity in the vicinity of the liquid helium temperature, due to a paramagnetic to antiferromagnetic phase transition.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

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