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Electrochemical Pitting And Repassivation On Icosahedral AL-CU-FE, And A Comparison With Crystalline Phases

Published online by Cambridge University Press:  10 February 2011

Nicholas A. Spurr ,
Patrick J. Pinhero ,
Daniel J. Sordelet ,
Kurt R. Hebert  and
Patricia A. Thiel
Nicholas A. Spurr
Affiliation:
Department of Chemistry and Ames Laboratory, Iowa State University, Ames, IA 50011 USA
Patrick J. Pinhero
Affiliation:
Department of Chemistry and Ames Laboratory, Iowa State University, Ames, IA 50011 USA
Daniel J. Sordelet
Affiliation:
Department of Chemistry and Ames Laboratory, Iowa State University, Ames, IA 50011 USA
Kurt R. Hebert
Affiliation:
Department of Chemistry and Ames Laboratory, Iowa State University, Ames, IA 50011 USA
Patricia A. Thiel
Affiliation:
Department of Chemistry and Ames Laboratory, Iowa State University, Ames, IA 50011 USA
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Abstract

We report the electrochemical potentials at which localized pitting and repassivation occur on icosahedral Al-Cu-Fe, and on a series of related alloys and elemental metals. The electrochemistry occurs in a buffered NaCI solution, pH 8.4. Under these conditions, pitting and repassivation appear to be controlled mainly by the chemical composition of the alloy, although the quasicrystalline phase displays an anomalous resistance to repassivation. Corrosion of this phase proceeds by dissolution of Al and Fe, leaving behind pits which are Cu-enriched.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 553: Symposium LL – Quasicrystals , 1998 , 275
Copyright
Copyright © Materials Research Society 1999

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References

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