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Electric-Field-Induced Displacements in Pt/PZT/Pt/SiO2/Si System Investigated by Finite Element Method: Material-Constant Dependences
Published online by Cambridge University Press: 26 February 2011
Abstract
Electric-field-induced displacements of PZT film capacitor Pt/PZT/Pt/SiO2/Si(100) were calculated by finite element method (FEM) with changing all piezoelectric and elastic constants of PZT so as to discuss how to evaluate intrinsic d33 of piezoelectric thin films. Two kinds of conditions, namely, “ideal conditions” and “second-best conditions” are discussed. The ideal conditions indicate that the diameter of top electrode φTE is equal to or less than PZT film thickness tPZT and continuous PZT is etched to isolate the capacitor from the continuous piezoelectric film layer. Under the ideal conditions, d33 measured by atomic force microscopy (AFM) and double beam interferometry (DBI) were the same value that was equal to intrinsic d33 of PZT and was independent of other material constants. Under the second-best conditions, i.e. 20×tPZT < φTE for DBI and 20×tPZT < φTE < 0.5×(tsub: substrate thickness) for AFM, measured d33 depended on only d31, s11, s12 and s13, and obeyed the Lefki's equation qualitatively. However, quantitative differences between FEM analysis and the Lefki's equation were not negligible.
- Type
- Research Article
- Information
- MRS Online Proceedings Library (OPL) , Volume 902: Symposium T – Ferroelectric Thin Films XIII , 2005 , 0902-T03-49
- Copyright
- Copyright © Materials Research Society 2006
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