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Effects of Surface Charge on the Processing of Nonaqueous Silicon Slurries

Published online by Cambridge University Press:  25 February 2011

Alan Bleier
Alan Bleier*
Affiliation:
Oak Ridge National Laboratory, P. 0. Box 2008, Oak Ridge TN 37831-6068
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Abstract

The influence of surface charge on the dispersion aspects of the nonaqueous processing of silicon powder is explained by the relationship between the liquid medium's dielectric constant and the maximum particle size that is stabilized by colloidal forces. The effects of surface charge, derived from the chemistry of the solid-liquid pair or the adsorption of ionic processing aids, are either great, significantly increasing the maximum particle size that is stable against agglomeration from the nanometer range to the micrometer range, or virtually undetectable, contributing nothing to enhanced stability. Guidelines for the processing of silicon powder when surface charge exists are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 249: Symposium Q – Synthesis and Processing of Ceramics: Scientific Issues , 1991 , 247
Copyright
Copyright © Materials Research Society 1992

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References

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