Hostname: page-component-78c5997874-s2hrs Total loading time: 0 Render date: 2024-11-02T23:33:06.234Z Has data issue: false hasContentIssue false
  • English
  • Français

Effect of Surface Roughness on Surface Photochemistry

Published online by Cambridge University Press:  21 February 2011

Kari B. Myli  and
Vicki H. Grassian
Kari B. Myli
Affiliation:
Department of Chemistry, University of Iowa, Iowa City, IA 52242
Vicki H. Grassian
Affiliation:
Department of Chemistry, University of Iowa, Iowa City, IA 52242
Get access

Abstract

Photoinduced processes on surfaces is of fundamental importance in materials processing. For example, photo-assisted chemical vapor deposition has been used to deposit a number of different materials on solid substrates. The effect of substrate morphology on photoinduced processes can be an important factor in film growth. In order to clarify the role of substrate morphology, in particular surface roughness, on surface photochemistry, we have examined the wavelength dependence of the photodissociation of chlorobenzene and 3-chloropyridine adsorbed on smooth and rough silver surfaces. As discussed below, we have measured a red shift in the photodissociation threshold for these molecules adsorbed on a rough surface relative to a smooth surface. The wavelength dependence of the photodissociation cross-section near the threshold has been measured in order to discern the origin of the red shift.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 354: Symposium A – Beam Solid Interactions for Materials Synthesis and Characterization , 1994 , 555
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Nitzan, A. and Brus, L.E., J. Chem. Phys. 75, 2205 (1981).Google Scholar
2 Gersten, J. and Nitzan, A., J. Chem. Phys. 75, 1139 (1981).Google Scholar
3 Gersten, J. and Nitzan, A., J. Chem. Phys. 73, 3023 (1980).Google Scholar
4 Goncher, G.M., Parsons, C.A., and Harris, C.B., J. Chem. Phys. 88, 4200 (1984).Google Scholar
5 Wolkow, R.A. and Moskovitz, M.J., J. Chem. Phys. 87, 5858 (1987).Google Scholar
6 Garoff, S., Weitz, D.A., and Alvarez, M.S., Chem. Phys. Lett. 93, 283 (1982).Google Scholar
7 Zhou, X.-L., Zhu, X.-Y., and White, J.M., Suf. Sci. Rep. 13, 73 (1991) and references therein.Google Scholar
8 Ho, W., in Desorption Induced by Electronic Transitions, DIET IV, edited by Betz, G. and Varga, P. (Springer-Verlag, Berlin, 1990), and references therein.Google Scholar
9 Polanyi, J.C. and Rieley, H., in Dynamics of Gas-Surface Interactions, edited by Rettner, C.T. and Ashfold, M.N.R. (Royal Society of Chemistry, London, 1991), p. 329.Google Scholar
10 Myli, K.B. and Grassian, V.H., J. Phys. Chem. 98, 6237 (1994).Google Scholar
11 Zhou, X.-L. and White, J.M., J. Chem. Phys. 92, 5612 (1990).Google Scholar
12 McGee, K.C. and Grassian, V.H. (unpublished data).Google Scholar
13 The Sadtler Standard Spectra. (Sadtler Research Laboratories, 1980).Google Scholar
14 Sass, J.K., Laucht, H., and Kliewer, K.L., Phys. Rev. Lett. 35, 1461 (1975).Google Scholar
15 Castro, M.E. and White, J.M., J. Chem. Phys. 95, 6057 (1991).Google Scholar