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The Effect of Soft Pre-Annealing of Differently Stacked Cu-Sn-Zn Precursors on the Quality of Cu2ZnSnSe4 Absorbers

Published online by Cambridge University Press:  28 August 2013

Monika Arasimowicz
Affiliation:
Laboratory for Energy Materials, University of Luxembourg, 41, rue du Brill, L-4422 Belvaux, Luxembourg
Maxime Thevenin
Affiliation:
Laboratory for Photovoltaics, University of Luxembourg, 41, rue du Brill, L-4422 Belvaux, Luxembourg
Phillip J. Dale
Affiliation:
Laboratory for Energy Materials, University of Luxembourg, 41, rue du Brill, L-4422 Belvaux, Luxembourg
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Abstract

Cu2ZnSnSe4 p-type semiconductors currently investigated for use in thin film solar cells can be synthesized by firstly depositing a metallic precursor and secondly annealing the precursor in selenium vapor. Differently stacked Cu-Sn-Zn metallic precursors were characterized after a soft annealing at 350°C under nitrogen atmosphere. For the stack where the Sn and Zn were in direct contact with sufficient Cu to form a stable alloy, a bi-layered structure consisting of Cu-Sn on the bottom and Cu-Zn on the top was formed. Contrarily, when Zn was not in direct contact with Cu, the metals diffused to form a stable alloy and the system segregates horizontally, forming a mixed columnar structure. These two types of precursors were selenized under exactly the same conditions to form kesterite absorbers for solar cell devices. Using this approach the improvement from 0.44% power conversion efficiency for the bi-layered precursor to 4.5% for the mixed precursor was achieved.

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

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References

REFERENCES

Araki, H., Mikaduki, A., Kubo, Y., Sato, T., Jimbo, K., Maw, W. S., Katagiri, H., Yamazaki, M., Oishi, K., Takeuchi, A., Thin Solid Films, 517, 14571460 (2008).CrossRefGoogle Scholar
Yoo, H., Kim, J., Thin Solid Films, 518, 65676572 (2010).CrossRefGoogle Scholar
Ahmed, S., Reuter, K. B., Gunawan, O., Guo, L., Romankiw, L. T., Deligianni, H., Advanced Energy Materials, 2, 253259 (2012).CrossRefGoogle Scholar
Chou, C.-y., Chen, S.-w., Acta Materialia, 54, 23932400 (2006).CrossRefGoogle Scholar
Scragg, J. J., Berg, D. M., Dale, P. J., J. Electroanal. Chem., 646, 5259 (2010).CrossRefGoogle Scholar
Djemour, R., Mousel, M., Redinger, A., Gutay, L., Crossay, A., Colombara, D., Dale, P., Siebentritt, S., Applied Physics Letters, 102, 222108 (2013)CrossRefGoogle Scholar
Redinger, A., Berg, D., Dale, P., Siebentritt, S., Journal of Am. Chem Soc., 133, 3320 (2011).CrossRefGoogle Scholar