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The Effect of Residual Stresses on the Rupture Properties of Film/Substrate Samples

Published online by Cambridge University Press:  22 February 2011

M. Ignat ,
A. Chouaf ,
C. Bernard  and
J.M. Terriez
M. Ignat
Affiliation:
L.T.P.C.M. ENSEEG, BP.75 Domaine Universitaire 38402 Saint Martin d'Hères
A. Chouaf
Affiliation:
L.T.P.C.M. ENSEEG, BP.75 Domaine Universitaire 38402 Saint Martin d'Hères
C. Bernard
Affiliation:
L.T.P.C.M. ENSEEG, BP.75 Domaine Universitaire 38402 Saint Martin d'Hères
J.M. Terriez
Affiliation:
IUT - Mécanique - Domaine Universitaire 38402 Saint Martin d'Hères
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Abstract

The residual stresses of two different film/substrate systems were calculated. Besides, several micromechanical tests were performed. Joining the calculated residual stresses to the analysis of the experimental results, some insight on the interfacial adhesion of film/substrate systems is presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 153: Symposium J – Interfaces Between Polymers, Metals, and Ceramics , 1989 , 357
Copyright
Copyright © Materials Research Society 1989

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References

1. - Röll, K. J. Appl. Phys. 47 (7), 3224–3229 (1976).Google Scholar
2. - Widmer, A.E., Rehwald, W. J. Electrochem. Soc. 133 (11), 2403–2409 (1986).Google Scholar
3. - Kinosita, K.. Thin Solid Films (12), 17 (1972).Google Scholar
4. - Timoshenko, S.P., Goodier, J.N., Théorie de l'é1asticité, (Translated from Theory of Elasticity, M.C. Graw Hill, Book Company New York, 1951).Google Scholar
5. - Jones, R.E., Basehore, M.. Appl. Phys. Lett. 50 (12), 725–727 (1987).Google Scholar
6. - Finegan, J.D., Hoffman, R.W., J. Appl. Phys. 30, 597 (1959)Google Scholar
7. - Marshall, D.B., Evans, A.G.. J. Appl. Phys. 56 (10), 2632–2638 (1984).Google Scholar
8. - Sinha, A.K., Levinstein, H.J., Smith, T.E.. J. Appl. Phys. 49 (4) 2423–2426 (1978).Google Scholar
9. - Shintani, A., Sugaki, S., Nakashima, H.. J. Appl. Phys. 51 (8), 4197–4205 (1980).Google Scholar
10. - Glang, R., Holmwood, R.A., Rosenfeld, R.L.. R. of Sc. Instr. 36 (1) 7–10 (1965).Google Scholar
11. - Drum, C.M., Rand, M.J., J. Appl. Phys. (39) 4458–4464 (1968).Google Scholar
12. - Hoffman, R.W., in Physics of non metallic thin films, edited by Dupuy, C. and Cachard, A.. (Plenum New-York 1976, 14) 214–276.Google Scholar