Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Kouvatsos, Dimitrios N.
Kung, Ji-Ho
Hatalis, Miltiadis K.
and
Jaccodine, Ralph J.
1992.
Fluorinated Gate Oxide Films Utilized in Polysilicon Thin Film Transistors.
MRS Proceedings,
Vol. 284,
Issue. ,
Kung, Ji-Ho
Hatalis, Miltiadis K.
and
Kanicki, Jerzy
1992.
Performance of Polycrystalline Silicon Thin Film Transistors with Double Layer Gate Dielectric.
MRS Proceedings,
Vol. 284,
Issue. ,
Kouvatsos, Dimitrios N.
Hatalis, Miltiadis K.
and
Jaccodine, Ralph J.
1992.
Fluorine-enhanced oxidation of polycrystalline silicon and application to thin-film transistor fabrication.
Applied Physics Letters,
Vol. 61,
Issue. 8,
p.
937.
Jeon, Yoo-Chan
Lee, Seok-Woon
and
Joo, Seung-Ki
1993.
Room Temperature Fabrication of Micro-Crystalline Silicon Films for Tft's By Ecr Pecvd.
MRS Proceedings,
Vol. 334,
Issue. ,
Kouvatsos, D.N.
and
Hatalis, M.K.
1996.
Polycrystalline silicon thin film transistors fabricated at reduced thermal budgets by utilizing fluorinated gate oxidation.
IEEE Transactions on Electron Devices,
Vol. 43,
Issue. 9,
p.
1448.
Kouvatsos, D.N.
Voutsas, A.T.
and
Hatalis, M.K.
1996.
High-performance thin-film transistors in large grain size polysilicon deposited by thermal decomposition of disilane.
IEEE Transactions on Electron Devices,
Vol. 43,
Issue. 9,
p.
1399.
Kaluri, Sita R.
Howell, Robert S.
Hess, Dennis W.
and
Hatalis, Miltiadis K.
1996.
Helical Resonator Plasma Oxidation of Amorphous and Polycrystalline Silicon for Flat Panel Displays.
MRS Proceedings,
Vol. 424,
Issue. ,
Min, Byung-Hyuk
Park, Cheol-Min
Jun, Jae-Hong
Bae, Byung-Sung
and
Han, Min-Koo
1996.
Performance of Poly-Si Tfts with Double Gate Oxide Layers.
MRS Proceedings,
Vol. 424,
Issue. ,
Kao, Chyuan Haur
Lai, Chao Sung
and
Lee, Chung Len
2007.
Electrical and Reliability Improvement in Polyoxide by Fluorine Implantation.
Journal of The Electrochemical Society,
Vol. 154,
Issue. 4,
p.
H259.