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Dry Etching to form Submicron Features in CMR Oxides: (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3

Published online by Cambridge University Press:  10 February 2011

K. P. Lee ,
K. B. Jung ,
H. Cho ,
D. Kumar ,
S. V. Pietambaram ,
R. K. Singh ,
P. H. Hogan ,
K. H. Dahmen ,
Y. B. Hahn  and
S. J. Pearton
K. P. Lee
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville FL 32611
K. B. Jung
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville FL 32611
H. Cho
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville FL 32611
D. Kumar
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville FL 32611
S. V. Pietambaram
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville FL 32611
R. K. Singh
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville FL 32611
P. H. Hogan
Affiliation:
Center for Materials Research and Technology, MARTECH, Florida State University, Tallahassee FL 32306
K. H. Dahmen
Affiliation:
Center for Materials Research and Technology, MARTECH, Florida State University, Tallahassee FL 32306
Y. B. Hahn
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville FL 32611
S. J. Pearton
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville FL 32611
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Abstract

Effective pattern transfer into (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3 has been achieved using Cl2/Ar discharges operated under Inductively Coupled Plasma conditions. Etch rates up to 900 Å-min−1 for (La,Sr)MnO3 and 300 Å-min−1 for (Pr,Ba,Ca)MnO3 were obtained, with these rates being a strong function of ion flux, ion energy and ion-to-neutral ratio. The etching is still physically-dominated under all conditions, leading to significant surface smoothing on initially rough samples. Sub-micron (0.35 μm) features have been produced in both materials using SiNx as the mask.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 574: Symposia BB – Multicomponent Oxide Films for Electronics , 1999 , 341
Copyright
Copyright © Materials Research Society 1999

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References

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