Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-11-24T17:40:59.408Z Has data issue: false hasContentIssue false

Domain Wall Contributions to the Piezoelectric Properties of Ferroelectric Ceramics and Thin Films, and Their Significance in Sensor and Actuator Applications

Published online by Cambridge University Press:  10 February 2011

D. Damjanovic
Affiliation:
Laboratory of Ceramics, Department of Materials, Swiss Federal Institute of Technology-EPFL, 1015 Lausanne, Switzerland
D. V. Taylor
Affiliation:
Laboratory of Ceramics, Department of Materials, Swiss Federal Institute of Technology-EPFL, 1015 Lausanne, Switzerland
A. L. Kholkin
Affiliation:
Laboratory of Ceramics, Department of Materials, Swiss Federal Institute of Technology-EPFL, 1015 Lausanne, Switzerland
M. Demartin
Affiliation:
Laboratory of Ceramics, Department of Materials, Swiss Federal Institute of Technology-EPFL, 1015 Lausanne, Switzerland
K. G. Brooks
Affiliation:
Laboratory of Ceramics, Department of Materials, Swiss Federal Institute of Technology-EPFL, 1015 Lausanne, Switzerland
N. Setter
Affiliation:
Laboratory of Ceramics, Department of Materials, Swiss Federal Institute of Technology-EPFL, 1015 Lausanne, Switzerland
Get access

Abstract

The piezoelectric and dielectric properties of ferroelectric thin films and ceramics were investigated in detail as a function of the frequency and amplitude of the driving field. A description, which is based on the theories of domain wall pinning by randomly distributed imperfections in magnetic materials, is used to interpret the electromechanical behaviour of several ferroelectric bulk ceramic and thin film compositions. With this approach, it is possible to make quantitative estimates of the domain wall contributions to the electromechanical properties of ferroelectric sensors and actuators.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Cross, L.E., in Ferroelectric Ceramics, edited by Setter, N. and Colla, E. (Birkhäuser, Basel, Switzerland, 1993), p. 1.Google Scholar
2. Li, S., Cao, W., and Cross, L.E., J. Appl. Phys. 69, 7219 (1991).Google Scholar
3. Zhang, Q.M., Pan, W.Y., Jang, S.J. and Cross, L.E., J. Appl. Phys. 64, 6445 (1988)Google Scholar
4. Arlt, G. and Pertsev, N.A., J. Appl. Phys. 70, 2283 (1991).Google Scholar
5. Damjanovic, D. and Demartin, M., J. Phys. D.: Appl Phys. 29, 2057 (1996)‥Google Scholar
6. Damjanovic, D., Phys. Rev. B 55, (1997) (in press).Google Scholar
7. Damjanovic, D. (unpublished).Google Scholar
8. Jiles, D., Introduction to Magnetism and Magnetic Materials (Chapman and Hall, London, 1991) p. 95175.Google Scholar
9. Demartin, M., PhD Thesis, Swiss Federal Institute of Technology-EPFL, Lausanne, 1996.Google Scholar
10. Rayleigh, Lord, Phil. Mag. 23, 225 (1887).Google Scholar
11. Damjanovic, D., Demartin, M., Chu, F., and Setter, N. in Proceedings of the tenth IEEE International symposium Applications of Ferroelectrics, Rutgers Univ., East Brunswick, NJ, USA, Aug 18–21, 1996. (in press)Google Scholar
12. Demartin, M. and Damjanovic, D., Appl. Phys. Lett. 68 3046 (1996).Google Scholar
13. Taylor, D. V., Brooks, K.G., Kholkin, A.L., Damjanovic, D. and Setter, N., Proceedings of the 5th International Conference on Electronic Ceramics & Applications ELECTROCERAMICS V, Univ. of Aveiro, Portugal, Sept. 2–4, 1996. Vol. 1, Ed. by Baptista, J.L., Labrincha, J.A. and Vilarinho, P.M. (Print: TIP A VE, Aveiro) pp. 341344.Google Scholar
14. Taylor, D.V. (unpublished)Google Scholar
15. Kholkin, A.L., Tagantsev, A.K., Brooks, K.G., Taylor, D.V., and Setter, N., in Proceedings of the Tenth IEEE International Symposium on Applications of Ferroelectrics, Rutgers Univ., East Brunswick, NJ, USA, Aug 18–21, 1996. (in press)Google Scholar
16. Brooks, K. G., Klissurska, R., Moeckli, P., and Setter, N., Microelectron. Eng. 29, 293 (1995).Google Scholar
17. Nattermann, T., Shapir, Y., and Vilfan, I., Phys. Rev. B 42 8577 (1990).Google Scholar
18. Kholkin, A.L. (unpublished).Google Scholar