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Direct Deposition of Silica Films Containing Organic Groups and Dyes from Silicon Alkoxide Solutions

Published online by Cambridge University Press:  10 February 2011

Junrok Oh ,
Hiroaki Imai ,
Hiroshi Hirashima  and
Koji Tsukuma
Junrok Oh
Affiliation:
Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi,Kohoku Yokohama 223, Japan
Hiroaki Imai*
Affiliation:
Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi,Kohoku Yokohama 223, Japan
Hiroshi Hirashima
Affiliation:
Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi,Kohoku Yokohama 223, Japan
Koji Tsukuma
Affiliation:
Tsukuba Research Laboratory, Tosoh Corporation, 43 Miyukigaoka, Tsukuba 305, Japan
*
†to whom correspondence should be addressed
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Abstract

A new direct-deposition process for silica thin films was developed using silicon alkoxide solutions. Silica thin films incorporating organic groups, such as methyl (CH3) and phenyl (C6H5 ) groups, were deposited on substrates from aqueous and ethanol solutions of organyltrialkoxysilane. Silica films without organic groups were also formed using ethanol solution of tetraalkoxysilane with aqueous ammonia. Composition of the deposited silica films were influenced by temperature and pH of the solutions and the starting alkoxides. From aqueous solutions containing organyltrialkoxysilane and organic dyes, such as Disperse Red 1 and Rhodamine B, silica films including the dyes were directly prepared on substrates. The composition of silica-organic hybrid films prepared by the deposition method was successfully controlled by selecting the deposition condition and the starting materials.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 435: Symposium V – Better Ceramics Through Chemistry VII , 1996 , 409
Copyright
Copyright © Materials Research Society 1996

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