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Device Applications of Rapid Thermal Processing

Published online by Cambridge University Press:  22 February 2011

J. F. Gibbons ,
D. M. Dobkin ,
M. E. Greiner ,
J. L. Hoyt  and
W. G. Opyd
J. F. Gibbons
Affiliation:
Stanford Electronics Laboratories, Stanford, California 94305
D. M. Dobkin
Affiliation:
Stanford Electronics Laboratories, Stanford, California 94305
M. E. Greiner
Affiliation:
Stanford Electronics Laboratories, Stanford, California 94305
J. L. Hoyt
Affiliation:
Stanford Electronics Laboratories, Stanford, California 94305
W. G. Opyd
Affiliation:
Stanford Electronics Laboratories, Stanford, California 94305
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Abstract

The potential of rapid thermal processing for applications in silicon integrated circuit technology, silicon microwave bipolar technology and GaAs FET technology is explored.In addition, two novel applications for GaAs processing are described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 23 , 1983 , 37
Copyright
Copyright © Materials Research Society 1984

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References

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