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Development of a Simple and Highly Sensitive Microbalance for Measurements of Total Particle Yields in Matrix Assisted Laser Desorption

Published online by Cambridge University Press:  01 January 1992

T. Huth-fehre ,
A.P. Quist ,
S-O. Linder  and
B.U.R. Sundqvist
T. Huth-fehre
Affiliation:
Division of Ion Physics, Department of Radiation Sciences, Uppsala University, Box 535, S–751 21 Uppsala, Sweden
A.P. Quist
Affiliation:
Division of Ion Physics, Department of Radiation Sciences, Uppsala University, Box 535, S–751 21 Uppsala, Sweden
S-O. Linder
Affiliation:
Division of Ion Physics, Department of Radiation Sciences, Uppsala University, Box 535, S–751 21 Uppsala, Sweden
B.U.R. Sundqvist
Affiliation:
Division of Ion Physics, Department of Radiation Sciences, Uppsala University, Box 535, S–751 21 Uppsala, Sweden
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Abstract

In order to open a new window for getting insight into the process of matrix assisted laser desorption ionization (MALDI) of biopolymers, a highly sensitive quartz crystal microbalance (QCM) was developed to measure desorption yields of neutral particles. For the matrix substances commonly used the mass resolution of 0.95 ng obtained with the balance corresponds to a detection limit of ∼1012 particles.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 181
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

1. Karas, M., Hillenkamp, F., Anal. Chem. 60(20), 2299 (1988)Google Scholar
2. Karas, M., Bahr, U., Hillenkamp, F., Int. J. Mass Spectrom. Ion Processes 92, 231 (1989)Google Scholar
3. Hillenkamp, F., Karas, M., Beavis, R. C., Chait, B. T., Anal. Chem. 63(24), 1193 (1991); Beavis, R. C., Org. Mass Spectrom. 27, 653 (1992); B. Spengler, R. Kaufmann, Analysis 20, 91 (1992)Google Scholar
4. Beavis, R. C., Org. Mass Spectrom. 27, 864 (1992)Google Scholar
5. Vertes, A., Microbeam Anal. 26, 25 (1991); Vertes, A., Juhasz, P., de Wolf, M., Gijbels, R., Int. J. Mass Spectrom. Ion Processes 94, 63 (1989)Google Scholar
6. Johnson, R. E., Sundqvist, B. U. R., Rapid Commun. Mass Spectrom. 5, 574 (1991)Google Scholar
7. Vertes, A., Gijbels, R., Levine, R. D., Rapid Commun. Mass Spectrom. 4(6), 228 (1990); Vertes, A., Gijbels, R., Scanning Microsc. 5(2), 317 (1991); A. Vertes, in Methods and Mechanisms for Producing Ions From Large Molecules, in the NATO ASI Series, edited by Ens, W. and Standing, K. G. (Plenum Press, New York, 1991); A. Vertes, R.D. Levine, Chem. Phys. Lett. 171(4), 284 (1990)Google Scholar
8. Lazare, S., Granier, V., Chem. Phys. Lett. 168, 593 (1990); J. Appl. Phys 63, 2110 (1988)Google Scholar
9. Strupat, K., Karas, M., Hillenkamp, F., Int. J. of Mass Spectrom. Ion Processes 111, 89 (1991)Google Scholar
10. Ens, W., Mao, Y., Mayer, F., Standing, K. G., Rapid Commun. Mass Spectrom. 5(3), 117 (1991)Google Scholar
11. Sauerbrey, G., Zeitschrift fUr Physik 178, 457 (1964)Google Scholar
12. Cichy, H., Fromm, E., Thin Solid Films 195(1–2), 147 (1991); Dubner, A. D., Wagner, A., J. Appl. Phys. 65(9), 3636 (1989)Google Scholar
13. Hinsberg, W. D., Kanazawa, K. K., Rev. Sci. Instrum. 60(3), 489 (1989); Reinisch, L., Kaiser, R. D., Krim, J., Phys. Rev. Lett. 63(16), 1743 (1989); R. Schumacher, Angewandte Chemie 29(4), 329 (1990); F. Lacour, R. Torresi, C. Gabrielli, J. Electrochem. Soc. 139(6), 1619 (1992)Google Scholar
14. Sauerbrey, G., Zeitschrift fir Physik 155, 206 (1959)Google Scholar
15. Huth, T.-Fehre, Becker, C. H., Rapid Commun. Mass Spectrom. 5(8), 378 (1991)Google Scholar