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Determination of the Roughness of CVD Surfaces by Laser Scattering

Published online by Cambridge University Press:  15 February 2011

Max Klein  and
Bernard Gallois
Max Klein
Affiliation:
Department of Materials Science and EngineeringStevens Institute of Technology, Hoboken, NJ 07030
Bernard Gallois
Affiliation:
Department of Materials Science and EngineeringStevens Institute of Technology, Hoboken, NJ 07030
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Abstract

A laser scattering apparatus was developed for the determination of surface roughness and other surface statistical parameters of chemically vapor-deposited coatings. Visual examination of HeNe laser scattering patterns reflected from polished sapphire and CVD titanium nitride surfaces showed a sensitivity to roughness differences of tens of nanometers. The scattering apparatus was integrated with a cold-wall CVD reactor. The root mean square roughness of silicon carbide deposits on silicon in the early stages of growth was determined from the intensity of the specularly reflected beam. Changes in roughness and the spatial arrangement of depositing crystallites were monitored in situ by angular resolution of the scattered light spectra. Both ex situ and in situ results were in good agreement with profilometric examinations of the rough surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 250: Symposium R – Chemical Vapor Deposition of Refractory Metals and Ceramics II , 1991 , 85
Copyright
Copyright © Materials Research Society 1992

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References

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