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Determination of Spin-Dependent Scattering Parameters of NiFe/Cu and Co/Cu Multilayers

Published online by Cambridge University Press:  15 February 2011

S.K.J. Lenczowski ,
M.A.M. Gijs ,
R.J.M. van de Veerdonk ,
J.B. Giesbers  and
W.J.M. de Jonge
S.K.J. Lenczowski
Affiliation:
Physics Dept., Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands Philips Research Laboratories, Professor Holstlaan 4, 5656 AA Eindhoven, The Netherlands
M.A.M. Gijs
Affiliation:
Philips Research Laboratories, Professor Holstlaan 4, 5656 AA Eindhoven, The Netherlands
R.J.M. van de Veerdonk
Affiliation:
Physics Dept., Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands Philips Research Laboratories, Professor Holstlaan 4, 5656 AA Eindhoven, The Netherlands
J.B. Giesbers
Affiliation:
Philips Research Laboratories, Professor Holstlaan 4, 5656 AA Eindhoven, The Netherlands
W.J.M. de Jonge
Affiliation:
Physics Dept., Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands
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Abstract

We present magnetoresistance (MR) data of high-vacuum magnetron sputtered NiFe/Cu multilayers (NiFe=Ni80Fe20) grown on Si(100) substrates with a Cu buffer layer and compare these with earlier results on Co/Cu(100) multilayers [1]. Measured MR values are directly proportional to the antiferromagnetically coupled fraction in the multilayers. Extrapolating to full antiparallel alignment, we can make a reliable comparison of the MR with the magnetoresistance model of Levy, Zhang, and Fert [2,3]. For the NiFe/Cu multilayers the deduced spin-asymmetry parameters are for interface and bulk scattering, respectively. Although much smaller than in our Co/Cu multilayers, , it is still the spin dependence of the interface scattering that is the main cause for the large MR values.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 384: Symposium L – Magnetic Ultrathin films, Multilayers and Surfaces , 1995 , 341
Copyright
Copyright © Materials Research Society 1995

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References

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