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A Detailed Study of the Synthesis of Bismuth Thin Films by PVD-Methods and their Structural Characterization

Published online by Cambridge University Press:  04 January 2013

Enrique Camps ,
Sandra E. Rodil ,
J. Antonio Salas  and
Horacio V. Estrada
Enrique Camps
Affiliation:
Instituto Nacional de Investigaciones Nucleares, Ocoyoacac, MEX,
Sandra E. Rodil
Affiliation:
Instituto de Investigaciones en Materiales – UNAM, México, DF
J. Antonio Salas
Affiliation:
Centro Nacional de Metrología, Querétaro, QRO 76246, MEXICO
Horacio V. Estrada
Affiliation:
Centro Nacional de Metrología, Querétaro, QRO 76246, MEXICO
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Abstract

A comprehensive and rather complete study for the synthesis of Bismuth thin-films using physical vapor deposition (PVD) techniques aimed at identifying key features of their crystallographic structure and morphology/topography, as a function of the synthesis method is presented. These films were deposited on oxidized and non-oxidized polished silicon substrates, glass-plates and polyimide flexible films, by thermal evaporation (resistive boat and e-beam) DC- and RF-magnetron assisted sputtering, and pulsed laser (ablation) deposition (PLD). The synthesis was performed controlling the main deposition parameters of these methods.

XRD-spectra conclusively indicate that the films can be preferentially oriented along the [003] or [012] Bi-structure’s directions, depending on the source-to- substrate (STS)-distance, sputtering power, substrate’s temperature and PLD ion’s kinetic energy. It is also concluded that a relatively short STS-distance results in a rather polycrystalline structure, near independent to the used sputtering power.

Keywords

sputteringlaser ablationBi
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1477: Symposium S1A – Low-Dimensional Bismuth-based Materials , 2012 , imrc12-1477-s1a-o007
Copyright
Copyright © Materials Research Society 2012 

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References

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