Hostname: page-component-78c5997874-ndw9j Total loading time: 0 Render date: 2024-11-17T03:24:34.976Z Has data issue: false hasContentIssue false
  • English
  • Français

Depth-profiling Pore Morphology in Nanoporous Thin Films Using Positronium Lifetime Annihilation Spectroscopy

Published online by Cambridge University Press:  01 February 2011

Richard S. Vallery ,
Hua-Gen Peng ,
William E. Frieze ,
David W. Gidley ,
Darren L. Moore  and
Richard J. Carter
Richard S. Vallery
Affiliation:
Department of Physics, University of Michigan, Ann Arbor, MI 48109
Hua-Gen Peng
Affiliation:
Department of Physics, University of Michigan, Ann Arbor, MI 48109
William E. Frieze
Affiliation:
Department of Physics, University of Michigan, Ann Arbor, MI 48109
David W. Gidley
Affiliation:
Department of Physics, University of Michigan, Ann Arbor, MI 48109
Darren L. Moore
Affiliation:
LSI Logic Corporation, 23400 NE Gilsan Street, Gresham, OR 97030
Richard J. Carter
Affiliation:
LSI Logic Corporation, 23400 NE Gilsan Street, Gresham, OR 97030
Get access

Abstract

Positronium annihilation lifetime spectroscopy (PALS) using a positron beam is a proven technique to characterize porosity in amorphous thin film materials. The capability to control the depth of the implanted positrons is unique to beams as compared to traditional bulk PALS techniques. By increasing the positron beam energy, positrons are implanted deeper into the film. Control of the positron implantation depth in beam-PALS allows analysis of sub- micron films, investigation of depth-dependent film inhomogeneities, determination of pore interconnection lengths, and access to buried films under barrier layers. Details on PALS depth profiling and an example of applying the technique to a plasma-enhanced-chemical-vapor- deposited (PECVD) porous film are presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 863: Symposium B – Materials, Technology and Reliability of Advanced Interconnects , 2005 , B1.6
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Maex, K., Baklanov, M.R., Shamiryan, D., Iacopi, F., Brongersma, S.H., and Yanovitskaya, Z.S., J. Appl. Phys. 93, 8793 (2003).Google Scholar
2. Wang, Y.Y., Nakanishi, H., Jean, Y.C., and Sandreczki, T.C., Journal of Polymer Science Part B-Polymer Physics 28, 1431 (1990).Google Scholar
3. Eldrup, M., Lightbody, D., and Sherwood, J.N., Chemical Physics 63 (1-2), 51 (1981).Google Scholar
4. Tao, S.J., Journal of Chemical Physics 56, 5499 (1972).Google Scholar
5. Charlton, M. and Humberston, J.W., Positron Physics. (Cambridge University Press, 2001).Google Scholar
6. Dull, T.L., Frieze, W.E., Gidley, D.W., Sun, J.N., and Yee, A.F., Journal of Physical Chemistry B 105, 4657 (2001).Google Scholar
7. Sun, J.N., Gidley, D.W., Hu, Y.F., Frieze, W.E., and Yang, S., Materials Research Society Symposium Proceedings 726, Q10.5 (2002).Google Scholar
8. Schultz, P.J. and Lynn, K.G., Rev. Mod. Phys. 60, 701 (1988).Google Scholar
9. Peng, H.G., Frieze, W.E., Vallery, R.S., Gidley, D.W., Moore, D.L., and Carter, R.J., Appl. Phys. Lett. 86, 121904 (2005).Google Scholar