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Deposition of Piezoelectric ZnO Films by RF Magnetron Sputtering and its Application to SAW Devices

Published online by Cambridge University Press:  01 February 2011

Seol Hee Choi  and
Chan Hyoung Kang
Seol Hee Choi
Affiliation:
[email protected], Korea Polytechnic University, Department of Advanced Materials Engineering, 2121 Jungwang-Dong, Shihung-Si, Kyonggi-Do, 429-793, Korea, Republic of
Chan Hyoung Kang
Affiliation:
[email protected], Korea Polytechnic University, Department of Advanced Materials Engineering, 2121 Jungwang-Dong, Shihung-Si, Kyonggi-Do, 429-793, Korea, Republic of
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Abstract

Highly c-axis oriented, dense, and fine-grained polycrystalline ZnO films with smooth surface and high resistivity were deposited on 4 inch silicon wafers by employing ZnO targets in a radio-frequency (RF) magnetron sputtering system. By changing applied RF power, substrate temperature and O2/Ar gas ratio, the optimum process parameters were found to be 150 W, 200 °C and 30/70, respectively. Applying the ZnO films deposited under these optimum conditions, surface acoustic wave (SAW) devices of ZnO/IDT/SiO2/Si structure were fabricated by conventional photolithography and etching processes. The interdigital transducers (IDT), made of the aluminum deposited by DC magnetron sputter, were patterned as 2.5/2.5 μm of finger width/spacing. Another type of SAW filter of IDT/ZnO/diamond/Si structure was fabricated. In this structure, high-quality nanocrystalline diamond (NCD) films were deposited on 4 inch silicon wafers by direct current (DC) plasma assisted chemical vapor deposition method using H2-CH4 mixture as precursor gas. On the top of the diamond films, ZnO films were deposited under the optimum conditions. The aluminum IDT pattern was fabricated on the ZnO/diamond layered films. The characteristics of the fabricated SAW devices were evaluated in terms of center frequency, insertion loss, and wave propagation velocity.

Keywords

piezoelectricsputteringdiamond
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1035: Symposium L – Zinc Oxide and Related Materials–2007 , 2007 , 1035-L05-16
Copyright
Copyright © Materials Research Society 2008

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