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Deep-Level Defects in Nitrogen-Doped 6H-SiC Grown by PVT Method

Published online by Cambridge University Press:  01 February 2011

Pawel Kaminski ,
Michal Kozubal ,
Krzysztof Grasza  and
Emil Tymicki
Pawel Kaminski
Affiliation:
[email protected], Institute of Electronic Materials Technology, Epitaxy Department, ul. Wólczyñska 133, Warszawa, 01-919, Poland, 48 609058857, 48 22 8349003
Michal Kozubal
Affiliation:
[email protected], Institute of Electronic Materials Technology, ul. Wólczyñska 133, Warszawa, 01-919, Poland
Krzysztof Grasza
Affiliation:
[email protected], Institute of Electronic Materials Technology, ul. Wólczyñska 133, Warszawa, 01-919, Poland
Emil Tymicki
Affiliation:
[email protected], Institute of Electronic Materials Technology, ul. Wólczyñska 133, Warszawa, 01-919, Poland
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Abstract

An effect of the nitrogen concentration on the concentrations of deep-level defects in bulk 6H-SiC single crystals is investigated. Six electron traps labeled as T1A, T1B, T2, T3, T4 and T5 with activation energies of 0.34, 0.40, 0.64, 0.67, 0.69, and 1.53 eV, respectively, were revealed. The traps T1A (0.34 eV) and T1B (0.40 eV), observed in the samples with the nitrogen concentration ranging from ∼2×1017 to 5×1017 cm−3, are attributed to complexes formed by carbon vacancies located at various lattice sites and carbon antisites. The concentrations of traps T2 (0.64 eV) and T3 (0.67 eV) have been found to rise from ∼5×1015 to ∼1×1017 cm−3 with increasing the nitrogen concentration from ∼2×1017 to ∼2.0×1018 cm−3. These traps are assigned to complexes involving silicon vacancies occupying hexagonal and quasi-cubic sites, respectively, and nitrogen atoms. The trap T4 (0.69 eV) concentration also substantially rises with increasing the nitrogen concentration and it is likely to be related to complexes formed by carbon antisites and nitrogen atoms. The midgap trap T5 (1.53 eV) is presumably associated with vanadium contamination. The presented results show that doping with nitrogen involves a significant change in the defect structure of 6H-SiC single crystals.

Keywords

deep level transient spectroscopy (DLTS)electronic materialdefects
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1069: Symposium D – Silicon Carbide 2008—Materials, Processing and Devices , 2008 , 1069-D07-04
Copyright
Copyright © Materials Research Society 2008

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References

REFERENCES

1. Garshin, A. P., Mokhov, E. N., and Shvaikom-Shvaikovskii, V. E., Refractories and Industrials Ceramics 44, 199 (2003).Google Scholar
2. Hobgood, H. McD., Glass, R. C., Augustine, G., Hopkins, R. H, Jenny, J., Skowronski, M., Mitchel, W. C., and Roth, M., Appl. Phys. Lett. 66, 1364 (1995).Google Scholar
3. Kamisński, P., Gawlik, G., and Kozłowski, R., Mat. Sci. Eng. B28, 439 (1994).Google Scholar
4. Aboelfotoh, M. O., Doyle, J. P., Phys. Rev. B 59, 10 823 (1999).Google Scholar
5. Chen, X. D., Fung, S., Ling, C. C., Beling, C. D., and Gong, M., J. Appl. Phys. 94, 3004 (2003).Google Scholar
6. Chen, X. D., Ling, C. C., Gong, M., Fung, S., Beling, C. D., Brauer, G., Anwand, W., and Skorupa, W., Appl. Phys. Lett. 86, 031903 (2003).Google Scholar
7. Pintilie, I., Pintilie, L., Irmscher, K., and Thomas, B., Appl. Phys. Lett. 81, 4841 (2002).Google Scholar
8. Polyakov, A. Y., Li, Q., Huh, S. W., Skowronski, M., Lopatiuk, O., Chernyak, L., and Sanchez, E. K., J. Appl. Phys. 97, 053703 (2005).Google Scholar
9. Mitchel, W. C., Mitchell, W. D., Landis, G., Smith, H. E., Lee, W. and Zvanut, M. E., J. Appl. Phys. 101, 013707 (2007).Google Scholar
10. Gerstmann, U., Rauls, E., Frauenheim, Th., and Overhof, H., Phys. Rev. B 67, 205202 (2003).Google Scholar