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Controlled Interface Roughness in GaAs/AlAs Superlattices

Published online by Cambridge University Press:  15 February 2011

William R. Miller Jr.
Affiliation:
Current Address: Guest Scientist at NIST, on leave from Penn State University, Middletown, PA 17057
W. J. Boettinger
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
W. F. Tseng
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
J. Pellegrino
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
J. Comas
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
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Abstract

We report the results of our study of controlled interface roughness in low-order GaAs/AlAs superlattices. Samples were prepared using either the interrupted growth or the migration-enhanced epitaxy (MEE) technique. The samples were prepared with m atomic planes of GaAs and m atomic planes of AlAs (m × m) per modulation wavelength and repeated p times. For this study, m = 1 or 3. The samples were studied using X-ray diffraction. The interrupted growth samples both showed a split in one diffraction line indicating layers were not of integral order while the MEE samples showed no splitting, indicating integral order layers.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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