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Characterization of Inconel/Carbon Multilayer Structures

Published online by Cambridge University Press:  25 February 2011

J. Liu ,
Y. Cheng ,
M. W. Lund ,
Q. Wang  and
A. Higgs
J. Liu
Affiliation:
Center for Solid State Science, Arizona State University, Tempe, AZ 85287
Y. Cheng
Affiliation:
Department of Physics, Arizona State University, Tempe, AZ 85287
M. W. Lund
Affiliation:
Multilayer Optics X-Ray Technology, Inc., Box 7070, University Station, Provo, UT 84602
Q. Wang
Affiliation:
Multilayer Optics X-Ray Technology, Inc., Box 7070, University Station, Provo, UT 84602
A. Higgs
Affiliation:
Center for Solid State Science, Arizona State University, Tempe, AZ 85287
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Abstract

DC magnetron sputtering technique is used to fabricate inconel/carbon multilayers (ML) for applications in soft x-ray optical systems. The ML films were characterized by small angle x-ray scattering (SAXS), high resolution electron microscopy (HREM) and high-angle annular darkfield (HAADF) microscopy techniques. The HREM showed that the ML films are composed of smooth layers of amorphous components. The HAADF showed strong interdiffusion between inconel and carbon. There is no indication of any pure inconel or carbon regions in the ML films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 238: Symposium Cb – Structure and Properties of Interfaces in Materials , 1991 , 647
Copyright
Copyright © Materials Research Society 1992

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References

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