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The Characterization Of Chemical Bath Deposited Cds On Single Crystal InP Substrates

Published online by Cambridge University Press:  10 February 2011

G. M. Riker ,
M. M. Al-Jassim  and
F. S. Hasoon
G. M. Riker
Affiliation:
National Renewable Energy Laboratory, Golden, CO 80401
M. M. Al-Jassim
Affiliation:
National Renewable Energy Laboratory, Golden, CO 80401
F. S. Hasoon
Affiliation:
National Renewable Energy Laboratory, Golden, CO 80401
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Abstract

We have investigated CdS thin films as possible passivating window layers for InP. The films were deposited on single crystal InP by chemical bath deposition (CBD). The film thickness, as optically determined by ellipsometry, was varied from 500 to 840Å. The film morphology was investigated by high resolution scanning electron microscopy (SEM), whereas the film microstructure was studied by X-ray diffraction (XRD) and cross-sectional transmission electron microscopy (TEM). Most of the films were fine-grained polycrystalline CdS, with some deposition conditions resulting in epitaxial growth. Cross-sectional TEM examination revealed the presence of interface contaminants. The effect of such contaminants on the film morphology and microstructure was studied, and various approaches for InP surface cleaning/treatment were investigated. The epitaxial films were determined to be hexagonal on both the (111) and (100) InP substrates; however, they were heavily faulted.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 485: Symposium G – Thin Film Structures for Photovoltaics , 1997 , 285
Copyright
Copyright © Materials Research Society 1998

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