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CCVD: Low-Cost Vapor-Deposition of Thin Films in Open Atmosphere

Published online by Cambridge University Press:  10 February 2011

Jerome J. Schmitt
Jerome J. Schmitt*
Affiliation:
MicroCoating Technologies, Inc. 3901 Green Industrial Way Chamblee, GA 30341
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Abstract

The new, patented Combustion Chemical Vapor Deposition (CCVD) process holds promise for low cost, high throughput manufacturing of thin film ceramic coatings with composition and microstructure tailored for specific applications in electronic, optic, anti-corrosion and anti-wear applications. The flame-based CCVD process is an open-air, non-vacuum, environmentally friendly process with the ability to produce coatings of equal or superior quality to those produced by conventional vacuum-based methods. Capital and operating costs for CCVD coating systems are significantly lower than, for example, conventional CVD and PVD technologies. As an open-atmosphere process, ccvD can be easily implemented in a continuous production line environment, avoiding the need for vacuum load-locks. MicroCoating Technologies has used CCVD to deposit over 60 different inorganic materials onto a variety of substrates ranging from metals and polymers to ceramics. Multi-layered films of complex composition have been achieved with excellent stoichiometric control. We review the CCVD process and characteristics of representative coatings

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 555: Symposium OO – Properties and Processing of Vapor-Deposited Coatings , 1998 , 255
Copyright
Copyright © Materials Research Society 1999

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