Hostname: page-component-78c5997874-xbtfd Total loading time: 0 Render date: 2024-11-02T23:14:39.717Z Has data issue: false hasContentIssue false
  • English
  • Français

Cathodic Arc Plasma Combinatorial Material Synthesis for Composition Search of New Amorphous Alloy

Published online by Cambridge University Press:  26 February 2011

Seiichi Hata ,
Ryusuke Yamauchi ,
Junpei Sakurai  and
Akira Shimokohbe
Seiichi Hata
Affiliation:
[email protected], Tokyo Institute of Technology, Frontier Collaborative Research Center, S2-8, 4259 Nagatuta, Midoriku, Yokohama, N/A, 226-8503, Japan, +81-45-924-5745, +81-45-924-5746
Ryusuke Yamauchi
Affiliation:
[email protected], Tokyo Institute of Technology, Precision and Intelligence Laboratory, Japan
Junpei Sakurai
Affiliation:
[email protected], Tokyo Institute of Technology, Precision and Intelligence Laboratory, Japan
Akira Shimokohbe
Affiliation:
[email protected], Tokyo Institute of Technology, Precision and Intelligence Laboratory, Japan
Get access

Abstract

Combinatorial arc plasma deposition (CAPD) method was used to search for new compositions of thin film amorphous alloys. A cathodic arc plasma gun (APG) was adopted as the deposition source for CAPD. The CAPD setup has three APGs radiating out from the center of a substrate. The APGs shoot pulse-like plasma shots one by one at a specific time interval. The plasma from each APG cathode is guided onto a specific area on a substrate by a magnetic field. Each such area overlaps the adjacent ones. Thus, a compositionally-graded thin film is deposited in the overlap area because of mixing of each deposited thin film from each APG that has a thickness grade. The deposited thin film is separated into 1,089 samples (the size of each is 1×1 mm2) using a grid on the substrate. The samples together are referred to as the thin film library. To demonstrate the capability of CAPD, two thin film libraries were deposited in this study. One is a thin film library of a PdCuSi alloy system, and the other is a MoZrPd system. The compositions and crystallinity of the samples were evaluated on the substrate using EDS and IP-XRD respectively. Analysis of the samples showed a graded composition, and some of the samples were shown to be amorphous in both libraries.

Keywords

combinatorial synthesisamorphousfilm
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 894: Symposium LL – Combinatorial Methods and Informatics in Materials Science , 2005 , 0894-LL03-28
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Hata, S., Yamauchi, R., Sakurai, J. and Shimokhobe, A., Jpn. J. Appl. Phys. (accepted)Google Scholar
2 Xiang, Xiao-Dong, Takeuchi, Ichiro, Combinatorial Material Synthesis (Marcel Dekker Inc. 2003).Google Scholar
3 Koinuma, H. and Takeuchi, I: Nature materials, 3 429 (2004).Google Scholar
4 Yamamoto, Y., Agawa, Y., Hara, Y., Amano, S., Chayahara, A., Horino, Y., Fujii, K.:Ion Implantation Technology Proceedings, 1998 International Conference on Volume 2, 22–26 June, 1148 (1998).Google Scholar
5 Turnbull, D., Trans.AIME 221, 422,(1961).Google Scholar
6 Inoue, A., Acta Materialia, 48, Issue 1, 1, 279, (2000).Google Scholar
7 Inoue, A., Mater. Sci. Forum, 179–181, 691 (1995).Google Scholar
8 Inoue, A., Mater. Sci. Eng., A226, 692 (1994).Google Scholar
9 Chen, H. S. and Turnbull, D.: Acta Metallurgica, Vol.17, Augast, 1021 (1969).Google Scholar
10 Hata, S., Sato, K. and Shimokohbe, A.: Proceedings of SPIE International Symposium on Microelectronics and Micro-Electro-Mechanical Systems MICRO/MEMS'99, 3892, Queensland, Australia, 97, (1999).Google Scholar