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Bubble formation and growth in glasses

Published online by Cambridge University Press:  15 February 2011

Xidong Chen ,
Robert C. Birtcher  and
S.E. Donnelly
Xidong Chen
Affiliation:
Materials Science Division Argonne National Laboratory 9700 S. Cass Ave., Argonne, IL 60439
Robert C. Birtcher
Affiliation:
Materials Science Division Argonne National Laboratory 9700 S. Cass Ave., Argonne, IL 60439
S.E. Donnelly
Affiliation:
Joule Physics Laboratory Science Research InstituteUniversity of Salford, UK
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Abstract

In this study, we simulated gas bubble formation in glasses by in-situ ion implantation. Alkali silicate glass and Na-borosilicate glass were implanted in situ with 50 keV Xe ions at temperatures at 200°C in a Hitachi-9000 electron microscope. Bubble formation was studied by transmission electron microscopy images taken during interruptions of the ion beam after discrete implanted-ion dose steps. We present a possible mechanism of bubble formation and growth based on amorphous network structures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 540: Symposium N / Microstructural Processes in Irradiated Materials , 1998 , 331
Copyright
Copyright © Materials Research Society 1999

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References

1. Crowley, Kevin D., Physics Today, 50, 32, (June 1997).Google Scholar
2. Weber, William J., Ewing, Rodney C., Angell, C. Austen, Arnold, George W., Cormack, Alastair N., Delaye, Jean Marc, Grisom, David L., Hobbs, Linn W., Navrotsky, Alexandra, Price, David L., Stoneham, A. Marshall, and Weinberg, Michael C., J. Mater. Res., 12, 1946 (1997).Google Scholar
3. Williams, David B. and Carter, C. Barry, Transmission Electron Microscopy, pp. 62, Plenum Press 1996.Google Scholar
4. Thompson, M. W., Defects and Radiation Damage in Metals, pp. 355, Cambridge University Press 1969.Google Scholar
5. Fehlner, Francis P., Low-temperature Oxidation, pp. 34–36, John Wiley & Sons, Inc. 1986.Google Scholar
6. Townsend, P. D., Kelly, J. C. and Hartley, N. E. W., Ion implantation, Sputtering and their applications, pp. 85, Academic Press 1976.Google Scholar