Hostname: page-component-78c5997874-8bhkd Total loading time: 0 Render date: 2024-11-03T02:28:07.480Z Has data issue: false hasContentIssue false

Behavior of Dopant-Related Defects in AlGaAs Superlattices

Published online by Cambridge University Press:  25 February 2011

N.D. Theodore
Affiliation:
Cornell University, Department of Materials Science and Engineering, Bard Hall, Ithaca, NY 14853
P. Mei
Affiliation:
Columbia University, Department of Electrical Engineering, 500 W. 120st St., New York, NY 10027
S.A. Schwarz
Affiliation:
Bell Communications Research Inc., 331 Newman Springs Rd., Redbank, NJ 07751.
C.B. Carter
Affiliation:
Cornell University, Department of Materials Science and Engineering, Bard Hall, Ithaca, NY 14853
C. Palmstrom
Affiliation:
Bell Communications Research Inc., 331 Newman Springs Rd., Redbank, NJ 07751.
J.P. Harbison
Affiliation:
Bell Communications Research Inc., 331 Newman Springs Rd., Redbank, NJ 07751.
L.T. Florez
Affiliation:
Bell Communications Research Inc., 331 Newman Springs Rd., Redbank, NJ 07751.
Get access

Abstract

During the course of investigation of the mixing of highly silicon-doped GaAs/AlAs superlattices, defects such as dislocation loops and Si-rich precipitates were found to form in the specimens. These defects formed at particular doping levels upon annealing of the samples. The presence of the defects can be related to changes in mixing behavior. In the present study, transmission electron microscopy has been used to characterize the defects. Superlattices with varying silicon doping levels were annealed at different temperatures for varying time-periods, to observe the temperature-time behavior of the dislocation loops. The defects aggregate preferentially in the GaAs as opposed to the AlAs in the superlattice. A number of the dislocation-loops were investigated using high-resolution TEM. All the loops observed were interstitial in nature.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Coleman, J.J., Dapkus, P.D., Kirkpatrick, C.G., Camras, M.D., and Holonyak, N. Jr., Appl. Phys. Lett. 40, 904 (1982).Google Scholar
2 Mei, P., Venkatesan, T., Schwarz, S.A., Stoffel, N.G., Harbison, J.P., Hart, D.L., and Florez, L.A., Appl. Phys. Lett. 52, 1487 (1988).Google Scholar
3 Gavrilovic, P., Deppe, D.G., Meehan, K., Holonyak, N. Jr., Coleman, J.J., and Burnham, R.D., Appl. Phys. Lett. 47, 130 (1985).Google Scholar
4 Ralston, J., Wicks, G.W., Eastman, L.F., De Cooman, B.C., and Carter, C.B., J. Appl. Phys. 59, 120 (1986).Google Scholar
5 De Cooman, B.C., Carter, C.B., and Ralston, J.R., SPIE Vol. 797 Advanced Processing of Semiconductor Devices, 185 (1987); B.C. De Cooman, C.B. Carter, J. Ralston, G.W. Wicks, and LF. Eastman, Mat. Res. Soc. Symp. Proc. 56, 333 (1986).Google Scholar
6 Holonyak, N. Jr., Laidig, W.D., Coleman, J.J., and Dapkus, P.D., Appl. Phys. Lett. 39, 102 (1981).Google Scholar
7 Kawabe, M., Matsuara, N., Shimizu, N., Hasegawa, F., and Nannichi, Y., Jpn. J. Appl. Phys. Lett. 23, L623 (1984).Google Scholar
8 Meehan, K., Gavrilovic, P., Holonyak, N. Jr., Burnham, R.D., and Thornton, R., Appl. Phys. Lett. 46, 75 (1985).Google Scholar
9 Venkatesan, T., Schwarz, S.A., Hwang, D.M., Bhat, R., Koza, M., Yoon, H.W., Mei, P., Arakawa, Y., and Yariv, A., Appl. Phys. Lett. 49, 701 (1986).Google Scholar
10 Venkatesan, T., Schwarz, S.A., Hwang, D.M., Bhat, R., Yoon, H.W., Arakawa, Y., in Proceeding of Ion Beam Modification of Materials Conference, Catania, Italy, 1986, edited by Rimini, E. (Elsevier, The Netherlands, 1987); also Nucl. Instrum. Methods B19/20, 777 (1987).Google Scholar
11 Rao, E.V.K., Thibierge, H., Brillouet, F., Alexandre, F., and Azoulay, R., Appl. Phys. Lett 46, 869 (1985).Google Scholar
12 Deppe, D.G., Holonyak, N. Jr., Hsieh, K.C., Gavrilovic, P., Stutius, W., and Williams, J., Appl. Phys. Lett. 51, 581 (1987).Google Scholar
13 Mei, P., Yoon, H.W., Venkatesan, T., Schwarz, S.A., and Harbison, J.P., Appl. Phys. Lett. 50, 1823 (1987).Google Scholar
14 Mei, P., Schwarz, S.A., Venkatesan, T., Schwartz, C.L., Harbison, J.P., Florez, L., Theodore, N.D., and Carter, C.B., Appl. Phys. Lett. 53, 2650 (1988).Google Scholar
15 Theodore, N.D., Carter, C.B., Mei, P., Schwarz, S.A., Venkatesan, T., and Harbison, J.P., Mater. Res. Soc. Symp. Proc. (1988).Google Scholar
16 Theodore, N.D., Schwarz, S.A., Carter, C.B., Mei, P., Palmstrom, C., and Harbison, J.P., to be published.Google Scholar