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Atomistic modeling of alloy self-growth by vapor deposition: Ni and Al on NiAl(110)

Published online by Cambridge University Press:  17 May 2012

Yong Han  and
J. W. Evans
Yong Han
Affiliation:
Institute for Physical Research and Technology, Iowa State University, Ames, Iowa 50011
J. W. Evans
Affiliation:
Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011 Ames Laboratory - USDOE, Iowa State University, Ames, Iowa 50011
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Abstract

A multisite lattice-gas (msLG) model with realistic and precise surface diffusion kinetics is applied to provide a reliable description of the initial stages of non-equilibrium self-growth of a NiAl alloy by simultaneous stoichiometric codeposition of Ni and Al on the NiAl(110) surface. Deposition at 300 K produces intermixing but poor alloy ordering. Increasing temperature enhances alloy ordering to near perfection at 600 K, but island shapes remain un-equilibrated.

Keywords

alloysimulationmolecular beam epitaxy (MBE)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1411: Symposium EE – Self Organization and Nanoscale Pattern Formation , 2012 , mrsf11-1411-ee10-03
Copyright
Copyright © Materials Research Society 2012

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References

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