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ATMOSPHERIC PRESSURE MICROWAVE PLASMA ENHANCED COATING OF CARBON NANOTUBE RIBBONS

Published online by Cambridge University Press:  21 July 2011

Rutvij Kotecha
Affiliation:
Materials Engineering, School of Energy, Environment, Biological & Medical Engineering (SEEBME), University of Cincinnati, Cincinnati, OH, USA 45221
A. Davison Gilpin
Affiliation:
Materials Engineering, School of Energy, Environment, Biological & Medical Engineering (SEEBME), University of Cincinnati, Cincinnati, OH, USA 45221
Chaminda Jayasinghe
Affiliation:
Materials Engineering, School of Energy, Environment, Biological & Medical Engineering (SEEBME), University of Cincinnati, Cincinnati, OH, USA 45221
Mark Schulz
Affiliation:
Mechanical Engineering Department, University of Cincinnati, Cincinnati, OH, USA 45221 Co-director Nanoworld Lab, University of Cincinnati, Cincinnati, OH, USA 45221
Vesselin Shanov
Affiliation:
Materials Engineering, School of Energy, Environment, Biological & Medical Engineering (SEEBME), University of Cincinnati, Cincinnati, OH, USA 45221 Co-director Nanoworld Lab, University of Cincinnati, Cincinnati, OH, USA 45221
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Abstract

CNT arrays were synthesized by Chemical Vapor Deposition (CVD) and spun into ribbons, which were coated using Atmospheric Pressure Microwave Plasma system. Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) characterization of CNT ribbons indicated the presence of polymer films with CF2 as a repeat unit. Atomic concentration of C, F and O in the coated films was estimated from X-ray Photoelectron Spectroscopy (XPS) data. Types of bonding between the elements in the coated films was studied by curve fitting of C 1s XPS spectra.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

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References

REFERENCES

[1] Feng-Lei, Zhou, Gong, Rong-Hua, Porat, Isaac, “Nano-coated hybrid yarns using electrospinning,” Surface & Coatings Technology, vol. 204, pp. 34593463, 2010.Google Scholar
[2] Wylie, S. R., Al-Shamma’a, A. I., Lucas, J., “Microwave Plasma System for Material Processing,” IEEE Transactions on Plasma Science, vol. 33, 04 2005 2005.Google Scholar
[3] Nikolov Shanov, S. D. Vesselin, Farhad Miralai, Seved, Andrew McDaniel, John, “Apparatus and method for treating a workpiece using plasma generated from microwave radiation,” United States Patent.Google Scholar
[4] Kumar, Virendra, Pulpytel, Jerome, Arefi-Khonsari, Farzaneh, “Fluorocarbon Coatings Via Plasma Enhanced Chemical Vapor Deposition of 1H,1H,2H,2Hperfluorodecyl Acrylate-1, Spectroscopic Characterization by FT-IR and XPS,” Plasma Processes and Polymers vol. 7, 2010.Google Scholar
[5] Jessie Lue, Shingjiang, Hsiaw, Shiang-Yiaw, Wei, Ta-Chin, “Surface modification of perfluorosulfonic acid membranes with perfluoroheptane (C7F16)/argon plasma,” Journal of Membrane Science, vol. 305, 2007.Google Scholar
[6] Briggs, D., Brown, A., Vickerman, J., “Handbook of Static Secondary Ion Mass Spectrometry,” p. 24, 1989.Google Scholar
[7] Brown, A., Vickerman, J. C., “A Comparison of Positive and Negative Ion Static SIMS Spectra of Polymer Surfaces,” Surface and Interface Analysis, vol. 8, 1986.Google Scholar
[8] Kwon, Ji Hye, Youn, So Won, Kang, Yong-Cheol, “XPS Investigation of A3 Coupling Reaction in Room Temperature Ionic Liquids,” Bulletin of the Korean Chemical Society, vol. 27.Google Scholar
[9] Riddle, J., “SEMASPEC Test Method for XPS Analysis of Surface Composition and Chemistry of Electropolished Stainless Steel Tubing for Gas Distribution System Components,” SEMATECH Inc.Google Scholar
[10] Yang, G. H., Oh, S. W., Kang, E. T., Neoh, K. G., “Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates,” Journal of Vacuum Science & Technology A, vol. 20, 2002.Google Scholar