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Atmospheric Pressure Chemical Vapor Deposition of 3C-SiC

Published online by Cambridge University Press:  10 February 2011

Michael W. Russell ,
Jaime A. Freitas Jr. ,
Alan D. Berry  and
James E. Butler
Michael W. Russell
Affiliation:
NRC Postdoctoral Research Associate Naval Research Laboratory, Washington, DC 20375
Jaime A. Freitas Jr.
Affiliation:
Sachs/Freeman Associates, Landover, MD 20785
Alan D. Berry
Affiliation:
Naval Research Laboratory, Washington, DC 20375
James E. Butler
Affiliation:
Naval Research Laboratory, Washington, DC 20375
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Abstract

Optically transparent SiC deposits were grown via atmospheric pressure chemical vapor deposition (APCVD) on graphite substrates from methyltrichlorosilane (MTS) in hydrogen in a cold-walled, RF-induction furnace. Structural morphology was examined by scanning electron microscopy and correlated to substrate temperature, MTS/H2 ratio, and hydrogen flow. Photoluminescence revealed that high quality cubic material was grown. The PL spectra exhibited a zero phonon line (2.3787 eV) attributable to an exiton bound to a neutral nitrogen donor, in addition to TA, LA, TO, and LO phonon replicas. Observed broadening and splitting of the PL spectral lines was associated with the morphological habit and internal strain of individual crystallites. In addition, the PL spectra for samples grown at higher MTS/H2 ratios and low H2 flows exhibited weak shoulders on the low energy side of the five-line spectra which might be associated with nonstoichiometric defects such as Si interstitials or C vacancies.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 410: Symposium S – Covalent Ceramics III-Science and Technology of Non-Oxides , 1995 , 351
Copyright
Copyright © Materials Research Society 1996

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References

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