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Anisotropy Energies and Critical Behavior of Ultrathin Ni(111) Films Grown on Smooth and Rough W(110) (invited)

Published online by Cambridge University Press:  26 February 2011

Yi Li  and
K. Baberschke
Yi Li
Affiliation:
Institut für Experimentalphysik, Freie Universität Berlin, Arnimallee 14, 1000 Berlin 33, Federal Republic of Germany
K. Baberschke
Affiliation:
Institut für Experimentalphysik, Freie Universität Berlin, Arnimallee 14, 1000 Berlin 33, Federal Republic of Germany
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Abstract

6 to 80 Å thin Ni(111) films were prepared on smooth and rough W(110) substrates in UHV and characterized by LEED and Auger spectroscopies. The measurements of the magnetic properties were carried out in situ by ferromagnetic resonance at 9 GHz between 300 and 600 K. We found that the effective anisotropies, which consist of surface, crystal, and stress induced anisotropy, increase with decreasing film thickness and temperature. The roughness of the substrate results in the drastic decrease of the effective anisotropy. This is attributed to the change of the surface structure and the stress within the Ni films. Furthermore we found that the Curie temperature Tc and the critical exponent β of Ni films on the smooth and rough substrates show no change.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 231: Symposium S – Magnetic Surfaces, Thin Films and Multilayers , 1991 , 289
Copyright
Copyright © Materials Research Society 1992

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