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An X-ray Photoelectron Spectroscopie Study of B-N-Ti system

Published online by Cambridge University Press:  10 February 2011

Sudipta Seal ,
Tery L. Barr ,
Natalie Sobczak ,
Ewa Benko  and
J. Morgiel
Sudipta Seal
Affiliation:
MS 7–222, Advanced Light Source, LBL, UC-Berkeley, Berkeley, CA 94720, USA, [email protected]
Tery L. Barr
Affiliation:
Materials Eng. and Laboratory for Surface Studies, University of Wisconsin, EMS 574, 3200 N. Cramer St., Milwaukee, WI 53211, USA, [email protected]
Natalie Sobczak
Affiliation:
Foundry Research Institute, Cracow, 30–418, Poland, [email protected]
Ewa Benko
Affiliation:
Institute of Metal Cutting, Cracow 30–011, Poland, [email protected]
J. Morgiel
Affiliation:
Institute of Metallurgy and Materials Science, Polish Academy of Sciences, Cracow., Poland, nmmorgie @al.imim-pan.krakow.pl
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Abstract

Composite nitrides (such as BN, TiN) are widely used in various industrial applications because of their extreme wear and corrosion resistance, thermal and electrical properties. In order to obtain composite materials with mese optimal properties, it is important to elucidate whether any chemical reactions occur at nitride/metal interfaces, e.g., those involving BN-Ti/TiN. Materials of interest include the deposition by PVD of Ti and TiN on BN substrates. Some of these systems were then subjected to varying degrees of physical and thermal alteration. Detailed X-ray photoelectron spectroscopy (XPS) has merefore been rendered of these interfaces using cross-sectional display and sputter etching. Resulting structural and morphological features have been investigated with transmission electron microscopy (TEM) and X-ray diffraction (XRD). Diffusion of the nitridation, oxynitride formation and interfacial growth are of general interest.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 472: Symposium I – Polycrystalline Thin Films - Structure, Texture, Properties..III , 1997 , 269
Copyright
Copyright © Materials Research Society 1997

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References

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