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An Apparatus for Magnetron Sputter Coating and Plasma Immersion Ion Implantation

Published online by Cambridge University Press:  21 February 2011

W. Ensinger ,
J. Hartmann ,
J. Klein ,
P. Usedom ,
B. Stritzker  and
B. Rauschenbach
W. Ensinger
Affiliation:
Universität Augsburg, Institut für Physik, Augsburg, Germany
J. Hartmann
Affiliation:
Universität Augsburg, Institut für Physik, Augsburg, Germany
J. Klein
Affiliation:
Fraunhofer-Institut für Lasertechnik, Aachen, Germany
P. Usedom
Affiliation:
Fraunhofer-Institut für Lasertechnik, Aachen, Germany
B. Stritzker
Affiliation:
Universität Augsburg, Institut für Physik, Augsburg, Germany
B. Rauschenbach
Affiliation:
Universität Augsburg, Institut für Physik, Augsburg, Germany
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Abstract

A coating apparatus which combines two material modification techniques, sputter coating and plasma immersion ion implantation, is described. The plasma is generated by an electron cyclotron resonance microwave plasma source. In the upper part of the vacuum chamber, the plasma is confined in a magnetic field by means of a solenoid. In the lower part, a magnetron sputter cathode is mounted which is used for depositing thin films on the sample. The sample is clamped onto a water-cooled sample holder which can be moved in vertical direction. It is connected to a semiconductor-based high voltage pulse generator which provides negative voltage pulses. In this apparatus, a substrate can be pre-implanted by plasma immersion ion implantation, then it can be coated by sputtering. Finally, the sputtered film can be modified by another ion implantation step.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 396: Symposium A – Ion-Solid Interactions for Materials Modification and Processing , 1995 , 521
Copyright
Copyright © Materials Research Society 1996

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