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Amorphous Silicon as an Active Material in Optical Resonators

Published online by Cambridge University Press:  01 February 2011

Dennis Hohlfeld  and
Hans Zappe
Dennis Hohlfeld
Affiliation:
[email protected], University of Freiburg, Department of Microsystems Engineering, Georges-Koehler-Allee 102, Freiburg, N/A, 79110, Germany, +49 761 203 7581, +49 761 203 7439
Hans Zappe
Affiliation:
[email protected], University of Freiburg, Department of Microsystems Engineering, Georges-Koehler-Allee 102, Freiburg, N/A, 79110, Germany
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Abstract

The application of amorphous silicon as a thermo-optically active material in MEMS-based, tunable optical filters is presented. The thin film interference filter employs a solid-state silicon cavity and silicon-based distributed Bragg reflectors (DBR). Tuning is achieved by varying the the resonator's refractive index and thus its optical thickness through thermal modulation. The filter is configured as a membrane and operates up to a temperature of 450 °C. Such a filter is essential for monitoring and reconfiguration of optical data communication networks and is also applicable for chemical and gas sensing.

Keywords

Siopticalabsorption
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 910: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology – 2006 , 2006 , 0910-A17-01
Copyright
Copyright © Materials Research Society 2006

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References

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