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Advanced Deposition Phase Diagrams for Guiding Si:H-Based Multijunction Solar Cells

Published online by Cambridge University Press:  01 February 2011

Jason Collins
Affiliation:
[email protected], University of Toledo, Department of Physics and Astronomy, Toledo, OH, 43606, United States
Nikolas J. Podraza
Affiliation:
[email protected], University of Toledo, Department of Physics and Astronomy, Toledo, OH, 43606, United States
Jian Li
Affiliation:
[email protected], University of Toledo, Department of Physics and Astronomy, Toledo, OH, 43606, United States
Xinmin Cao
Affiliation:
[email protected], University of Toledo, Department of Physics and Astronomy, Toledo, OH, 43606, United States
Xunming Deng
Affiliation:
[email protected], University of Toledo, Department of Physics and Astronomy, Toledo, OH, 43606, United States
Robert W. Collins
Affiliation:
[email protected], University of Toledo, Physics and Astronomy, 2801 W. Bancroft Street, Mail drop 111, Toledo, OH, 43606, United States
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Abstract

Phase diagrams have been established to describe very high frequency (vhf) plasma-enhanced chemical vapor deposition (PECVD) processes for intrinsic hydrogenated silicon (Si:H) and silicon-germanium alloy (Si1-xGex:H) thin films using crystalline Si substrates that have been over-deposited with n-type amorphous Si:H (a-Si:H). The Si:H and Si1-xGex:H processes are applied for the top and middle i-layers of triple-junction a-Si:H-based n-i-p solar cells fabricated at University of Toledo. Identical n/i cell structures were co-deposited on textured Ag/ZnO back-reflectors in order to correlate the phase diagram and the performance of single-junction solar cells, the latter completed through over-deposition of the p-layer and top contact. This study has reaffirmed that the highest efficiencies for a-Si:H and a-Si1-xGex:H solar cells are obtained when the i-layers are prepared under maximal H2 dilution conditions.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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