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X-ray Photoelectron Spectroscopy of the Interface Between Diamond Films and Tantalum Substrates

Published online by Cambridge University Press:  15 February 2011

M.M. Waitew  and
S. Ismat Shah
M.M. Waitew
Affiliation:
Department of Physics and Astronomy, University of Delaware, Newark, DE 19716.
S. Ismat Shah
Affiliation:
Department of Physics and Astronomy, University of Delaware, Newark, DE 19716. E.I. du Pont de Nemours and Company, Central Research and Development, Experimental Station, P.O. Box 80356, Wilmington, DE 19880–0356.
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Abstract

Diamond films were deposited in a microwave plasma chemical vapor deposition (MPCVD) system on Ta substrates using a mixture of hydrogen and methane gases. The films were grown for varying lengths of time to provide samples with no diamond growth to a continuous diamond film. These films were analyzed using X-ray photoelectron spectroscopy (XPS) in order to understand the time dependent interactions between the substrate and the incoming carbon flux. Photoelectron peaks in the Ta 4f, C Is and Ols regions have been analyzed. In the initial stages of growth, a layer of carbide forms on the substrate. As the substrate becomes supersaturated with carbon, graphite starts to form on the surface. A diamond peak begins to appear after about 30 Minutes of deposition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 317: Symposium B – Mechanisms of Thin Film Evolution , 1993 , 529
Copyright
Copyright © Materials Research Society 1994

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References

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