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Vibrating RF MEMS for Low Power Communications

Published online by Cambridge University Press:  11 February 2011

Clark T.-C. Nguyen*
Affiliation:
Center for Integrated Wireless Microsystems, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109–2122, U.S.A.
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Abstract

Micromechanical communication circuits fabricated via IC-compatible MEMS technologies and capable of low-loss filtering, mixing, switching, and frequency generation, are described with the intent to miniaturize wireless transceivers. Possible transceiver front-end architectures are then presented that use these micromechanical circuits in large quantities to substantially reduce power consumption. Technologies that integrate MEMS and transistor circuits into single-chip systems are then reviewed with an eye towards the possibility of single-chip communication transceivers.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCES

[1] Nguyen, C. T.-C., Katehi, L.P.B., and Rebeiz, G. M., “Micromachined devices for wireless communications (invited),” Proc. IEEE, Vol. 86, no. 8, pp. 17561768, Aug. 1998.Google Scholar
[2] Core, T. A., Tsang, W. K., Sherman, S. J., “Fabrication technology for an integrated surface-micromachined sensor,” Solid State Technology, pp. 3947, Oct. 1993.Google Scholar
[3] Smith, J. H., Montague, S., Sniegowski, J. J., Murray, J. R., et al., “Embedded micromechanical devices for the monolithic integration of MEMS with CMOS,” Tech. Digest, IEEE Int. Electron Devices Meeting (IEDM), Washington, D.C., Dec. 10–13, 1995, pp. 609612.Google Scholar
[4] Bustillo, J. M., Fedder, G. K., Nguyen, C. T.-C., and Howe, R. T., “Process technology for the modular integration of CMOS and polysilicon microstructures,” Microsystem Technologies, 1 (1994), pp. 3041.Google Scholar
[5] Franke, A. E., Bilic, D., Chang, D. T., Jones, P. T., King, T.-J., Howe, R. T., and Johnson, G. C., “Post-CMOS integration of germanium microstructures,” Technical Digest, 12th Int. IEEE MEMS Conf., Orlando, FA, Jan. 17–21, 1999, pp. 630637.Google Scholar
[6] Baltes, H., Paul, O., and Brand, O., “Micromachined thermally based CMOS microsensors,” Proc. IEEE, Vol. 86, no. 8, pp. 16601678, Aug. 1998.Google Scholar
[7] Fedder, G. K., Santhanam, S., Reed, M. L., Eagle, S. C., Guillou, D. F., Lu, M. S.-C., and Car-ley, L. R., “Laminated high-aspect-ratio microstructures in a conventional CMOS process,” Sensors and Actuators, vol. A57, no. 2, pp. 103110, March 1997.Google Scholar
[8] Wong, A.-C., Xie, Y., and Nguyen, C. T.-C., “A bonded-micro-platform technology for modular merging of RF MEMS and transistor circuits,” to be published in the Digest of Technical Papers, the 11th Int. Conf. on Solid-State Sensors & Actuators (Transducers'01), Munich, Germany, June 10–14, 2001 (4 pages).Google Scholar
[9] Nguyen, C. T.-C., “Micromechanical circuits for communication transceivers (invited),” Proceedings, 2000 Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), Minneapolis, Minnesota, September 25–26, 2000, pp. 142149.Google Scholar
[10] Nguyen, C. T.-C., “Transceiver front-end architectures using vibrating micromechanical signal processors,” chapter in RF Technologies for Low Power Wireless Communications, edited by Haddad, G. I., Itoh, T., and Harvey, J. (35 pages). New York: Wiley IEEE-Press, 2001.Google Scholar
[11] Bustillo, J. M., Howe, R. T., and Muller, R. S., “Surface micromachining for microelectromechan-ical systems (invited),” Proc. IEEE, Vol. 86, no. 8, pp. 15521574, Aug. 1998.Google Scholar
[12] Nguyen, C. T.-C. and Howe, R. T., “An integrated CMOS micromechanical resonator high-Q oscillator,” IEEE J. Solid-State Circuits, Vol. 34, no. 4, pp. 440445, April 1999.Google Scholar
[13] Hsu, W. -T. and Nguyen, C. T. -C., “Stiffness-compensated temperature-insensitive microme-chanical resonators,” Tech. Digest, 2002 IEEE Int. Micro Electro Mechanical Systems Conf., Las Vegas, Nevada, Jan. 20–24, 2002, pp. 731734.Google Scholar
[14] Bannon, F. D. III, Clark, J. R., and Nguyen, C. T.-C., “High frequency micromechanical filters,” IEEE J. Solid-State Circuits, Vol. 35, no. 4, pp. 512526, April 2000.Google Scholar
[15] Meng, Q., Mehregany, M., and Mullen, R. L., “Theoretical modelling of microfabricated beams with elastically restrained supports,” J. Microelectromech. Syst., Vol. 2, no. 3, pp. 128137, Sept. 1993.Google Scholar
[16] Cleland, A. N. and Roukes, M. L., “Fabrication of high frequency nanometer scale mechanical resonators from bulk Si crystals,” Appl. Phys. Lett., 69 (18), pp. 26532655, Oct. 28, 1996.Google Scholar
[17] Vig, J. R. and Kim, Y., “Noise in microelectromechanical system resonators,” IEEE Trans. Utra-son. Ferroelec. Freq. Contr., Vol. 46, no. 6, pp. 15581565, Nov. 1999.Google Scholar
[18] Navid, R., Clark, J. R., Demirci, M., and Nguyen, C. T.-C., “Third-order intermodulation distortion in capacitively-driven CC-beam micromechanical resonators,” Technical Digest, 14th Int. IEEE Micro Electro Mechanical Systems Conference, Interlaken, Switzerland, Jan. 21–25, 2001, pp. 228231.Google Scholar
[19] Nguyen, C. T.-C., “Frequency-selective MEMS for miniaturized low-power communication devices,” IEEE Trans. Microwave Theory Tech., Vol. 47, no. 8, pp. 14861503, Aug. 1999.Google Scholar
[20] Wang, K., Wong, A.-C., and Nguyen, C. T.-C., “VHF free-free beam high-Q micromechanical resonators,” IEEE/ASME J. Microelectromech. Syst., Vol. 9, no. 3, pp. 347360, Sept. 2000.Google Scholar
[21] Clark, J. R., Hsu, W.-T., and Nguyen, C. T.-C., “High-Q VHF micromechanical contour-mode disk resonators,” Technical Digest, IEEE Int. Electron Devices Meeting, San Francisco, California, Dec. 11–13, 2000, pp. 399402.Google Scholar
[22] Wang, J. and Nguyen, C. T.-C., to be published.Google Scholar
[23] Hsu, W.-T., Clark, J. R., and Nguyen, C. T.-C., “A sub-micron capacitive gap process for multiple-metal-electrode lateral micromechanical resonators,” Technical Digest, 14th Int. IEEE Micro Electro Mechanical Systems Conference, Interlaken, Switzerland, Jan. 21–25, 2001, pp. 349352.Google Scholar
[24] Wong, A.-C., Clark, J. R., and Nguyen, C. T.-C., “Anneal-activated, tunable, 68MHz microme-chanical filters” Digest of Technical Papers, 10th Int. Conf. on Solid-State Sensors and Actuators, Sendai, Japan, June 7–10, 1999, pp. 13901393.Google Scholar
[25] Wong, A.-C., Ding, H., and Nguyen, C. T.-C., “Micromechanical mixer+filters,” Tech. Digest, IEEE Int. Electron Devices Meeting (IEDM), San Francisco, California, Dec. 6–9, 1998, pp. 471474.Google Scholar
[26] Goldsmith, C., Randall, J., Eshelman, S., Lin, T. H., Denniston, D., Chen, S. and Norvell, B., “Characteristics of micromachined switches at microwave frequencies,” IEEE MTT-S Digest, pp. 11411144, June, 1996.Google Scholar
[27] Young, D. J. and Boser, B. E., “A micromachined variable capacitor for monolithic low-noise VCOs,” Technical Digest, 1996 Solid-State Sensor and Actuator Workshop, Hilton Head Island, South Carolina, June 3–6, 1996, pp. 8689.Google Scholar
[28] Yoon, J.-B., Han, C.-H., Yoon, E., and Kim, C.-K., “Monolithic high-Q overhand inductors fabricated on silicon and glass substrates,” Technical Digest, IEEE IEDM, Washington, D. C., Dec. 5–8, 1999, pp. 753756.Google Scholar
[29] Singh, A., Horsley, D. A., Cohn, M. B., Pisano, A. P., and Howe, R. T., “Batch transfer of microstructures using flip-chip solder bonding,” J. Microelectromech. Syst., Vol. 8, no. 1, pp. 2733, March 1999.Google Scholar
[30] Wang, J., Butler, J. E., Hsu, D. S. Y., and Nguyen, C. T.-C., “High-Q micromechanical resonators in CH4-reactant-optimized high acoustic velocity CVD polydiamond,” Tech. Digest, 2002 Solid-State Sensor, Actuator, and Microsystems Workshop, Hilton Head, South Carolina, June 2–6, 2002, pp. 6162.Google Scholar
[31] Lebouitz, K. S., Mazaheri, A., Howe, R. T., and Pisano, A. P., “Vacuum encapsulation of resonant devices using permeable polysilicon,” Technical Digest, 12th Int. IEEE MEMS Conf., Orlando, Florida, Jan. 17–21, 1999, pp. 470475.Google Scholar
[32] Cheng, Y.-T., Hsu, W.-T., Lin, L., Nguyen, C. T.-C., and Najafi, K., “Vacuum packaging using localized aluminum/silicon-to-glass bonding,” Technical Digest, 14th Int. IEEE Micro Electro Mechanical Systems Conference, Interlaken, Switzerland, Jan. 21–25, 2001, pp. 1821.Google Scholar