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The Use of a Cold Gas Plasma for the Final Processing of Contamination-Free Tem Specimens

Published online by Cambridge University Press:  10 February 2011

P. E. Fischione ,
J. Ringnada ,
Y. Feng ,
T. Krekels ,
M Hayies ,
H. O. Colijn ,
M J. Mills  and
J. M Wiezorek
P. E. Fischione
Affiliation:
E. A Fischione Instruments, Inc., Export, PA 15632, USA
J. Ringnada
Affiliation:
Philips Electron Optics, Inc., Mahwah NJ 07430USA
Y. Feng
Affiliation:
Philips Electron Optics, Inc., Mahwah NJ 07430USA
T. Krekels
Affiliation:
Philips Electron Optics, Eindhoven, The Nethierlands
M Hayies
Affiliation:
Philips Electron Optics, Eindhoven, The Nethierlands
H. O. Colijn
Affiliation:
The Ohio State University, Columbus, OH 43210 USA
M J. Mills
Affiliation:
The Ohio State University, Columbus, OH 43210 USA
J. M Wiezorek
Affiliation:
The Ohio State University, Columbus, OH 43210 USA
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Abstract

The issue of specimen contamination becomes more important at a rate proportional to the use of high-brightness electron source Transmission Electron Microscopes (TMM). The trend in the transmission electron microscopy of materials science specimens is to use higher-voltage microscopes incorporating field emission gun technology [1]. These FEG TEMs combine smaller electron probes with increased beam current, allowing high resolution specimen imaging and enhanced analytical data collection. This is of particular importance for semiconductor specimens which demand fine-probe microanalyis.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 480: Symposium Z – Specimen Preparation for Transmission Electron Microscopy…IV , 1997 , 225
Copyright
Copyright © Materials Research Society 1997

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References

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