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Thermally Stimulated Electron Emission from Scratched Metal Surfaces

Published online by Cambridge University Press:  01 February 2011

Keiji Nakayama  and
Hitoshi Matamura
Keiji Nakayama
Affiliation:
National Institute of Advanced Industrial Science and Technology, Namiki 1-2-1 Tsukuba, 305-8564, Japan
Hitoshi Matamura
Affiliation:
National Institute of Advanced Industrial Science and Technology, Namiki 1-2-1 Tsukuba, 305-8564, Japan
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Abstract

In order to have a knowledge on electron emission from wearing metal surfaces under frictional heating, we investigated thermally stimulated electron emission (TSEE) phenomena together with thermoelectronic emission for 14 kinds of scratched metal surfaces, Al, Ti, V, Cr, Fe, Co, Ni, Cu, Mo, W, Pd, Pt, Ag and Au. The scratched metal surfaces in ambient air were thermally stimulated in a constant heating rate ranged from 1.3 to 4.4 °C/s from room temperature to 700 °C in a residual gas pressure of 10-4Pa in a vacuum chamber. During the stimulation, a channeling type secondary electron multiplier detected the electrons emitted from the scratched metal surfaces. The TSEE glow curves and the integrated electron emission intensities over tested temperature range for the metals are presented and the emission mechanisms are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 872: Symposium J – Micro- and Nanosystems—Materials and Devices , 2005 , J18.24
Copyright
Copyright © Materials Research Society 2005

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References

1 Nakayama, K., Leiva, J.A. and Enomoto, Y., Tribo. Int. 28, 507 (1995).Google Scholar
2 Nakayama, K., Suzuki, N. and Hashimoto, H., J. Phys. D: Appl. Phys. 25, 303(1995).Google Scholar
3 Nakayama, K. and Nevshupa, R.A., J. Phys. D: Appl. Phys. 35, L53 (2002).Google Scholar
4 Kramer, J., Z. Phys. 125, 739 (1949).Google Scholar
5 Zeeger, K., Z. Phys. 141, 221 (1955).Google Scholar
6 Hieslmair, H. and Mueller, H., Z. Phys. 152, 642 (1958).Google Scholar
7 Birgfellner, H. und Mueller, H., Acta Phys. Austriaca 14, 56 (1961)Google Scholar
8 Handbook of Chemistry and Physics, 79th Edition, edited by Lide, D.R., (CRC Press, NY, 1998/1999) pp.12–125.Google Scholar
9 Krylova, I.V., Proc. 4th Int. Symp. Exoelectron Emission Dosimetry, 145 (1974).Google Scholar
10 Bathow, G., Gobrecht, H., Z. Phys. 146, 1 (1956).Google Scholar