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Statistical Texture Analysis of Microscopy Images for the Purpose of Surface Characterization

Published online by Cambridge University Press:  26 February 2011

Thomas E Sadowski
Affiliation:
[email protected], Southern Connecticut State University, Physics, United States
Christine Caragianis Broadbridge
Affiliation:
[email protected], Southern Connecticut State University, Physics, 501 Crescent Street, JE119, New Haven, CT, 06515-1355, United States, 203-392-6461, 203-392-6466
John DaPonte
Affiliation:
[email protected], Southern Connecticut State University, Computer Science, United States
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Abstract

This study focuses on the application of an image processing technique known as texture analysis to provide a complementary method to process non-contact atomic force microscopy data. For the current study, SrBi2Ta9O9 (SBT) thin films (∼200nm) on silicon samples were prepared via MOD and imaged via nc-AFM. Previous studies have qualitatively chosen grain size or grain density to quantify the surface characteristics of SBT but for this study texture analysis was used. Results obtained from the texture analysis and the subsequent stepwise discriminant analysis illustrated the importance of grain density and its effect on the statistics obtained from the gray scale cooccurrence matrix.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

REFERENCES

[1] Pechkis, D.L., “The Microstructural Characterization of Thin Film Ferroelectrics for Electronic Applications.” Southern Connecticut State University Honors Thesis, 2001 Google Scholar
[2] Haralick, R.M. et al. , IEEE Trans. Sys., Man, and Cyb., 67, 786, 1979 Google Scholar
[3] Han, J.P, “Ferroelectric SrBi2Ta9O9 (SBT) and Metal/Ferroelectric/Insulator/Si Transistor for Memory Applications.” Yale University Technical Report, 2002.Google Scholar
[4] Ma, T.P., IEEE Trans. Electron Devices, 45, 680 (invited paper), 1998.Google Scholar
[5] Liu, X., Caragianis-Broadbridge, C., Lehman, A.H., McGuinness, J., and Ma, T.P., Ferroelectric Thin Films XII (Mater. Res. Soc. Symp. Proc. 2004), 784 Google Scholar