Hostname: page-component-78c5997874-ndw9j Total loading time: 0 Render date: 2024-11-08T02:39:15.040Z Has data issue: false hasContentIssue false
  • English
  • Français

Spuiter Deposition of Lithium Silicate — Lithium Phosphate Amorphous Electrolytes

Published online by Cambridge University Press:  28 February 2011

N. J. Dudney ,
J. B. Bates ,
J. D. Robertson  and
C. F. Luck
N. J. Dudney
Affiliation:
Solid State Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6030
J. B. Bates
Affiliation:
Solid State Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6030
J. D. Robertson
Affiliation:
Department of Chemistry, University of Kentucky, 800 Rose St. Lexington, KY 40506–0055
C. F. Luck
Affiliation:
Solid State Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6030
Get access

Abstract

Thin films of an amorphous lithium-conducting electrolyte were deposited by rf magnetronsputtering of ceramic targets containing Li4SiO4 and Li3PO4. The lithium content of the films was found to depend more strongly on the nature and composition of the targets than on many other sputtering parameters. For targets containing Li4SiO4, most of the lithium was found to segregate away from the sputtered area of the target. Codeposition using two sputter sources achieves a high lithium content in a controlled and reproducible film growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 210: Symposium L – Solid State Ionics II , 1990 , 579
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Bates, J. B., Dudney, N. J., Luck, C. F. and Klatt, L., in Ceramic Thick and Thin Films, Ceram. Trans., 11 (1990) 35.Google Scholar
2. Kanehori, K., Matsumoto, K., Miyauchi, K., and Kudo, T., Solid State lonics, 9/10 (1983) 1455.CrossRefGoogle Scholar
3. Miyauchi, K., Matsumoto, K., Kanehori, K., and Kedo, T., Dennki Kagaku, 51 (1983) 211.Google Scholar
4. Bates, J. B. et al. , this symposium.Google Scholar
5. Hu, Y-W., Raistrick, I. D., and Huggins, R. A., J. Electrochem. Soc., 124 (1977) 1240.CrossRefGoogle Scholar
6. Khorassani, A., Izquierdo, G., and West, A. R., Mat. Res. Bull., 16 (1981) 1561.Google Scholar
7. Wachs, A. L., Bates, J. B., Dudney, N. J., and.C. Luck, F., J. Vac. Sci. Tech., in press.Google Scholar
8. Waits, R. K., in Thin Film Processes, ed. by Vossen, J. L. and Kern, W., Academic Press, 1978, pp.131–170 Google Scholar
9. Barin, I and Knacke, O., Thermochemical Properties of Inorganic Substances, Springer-Verlag, 1973.Google Scholar
10. Machida, N., Tatsumisago, M., and Minamii, T., Yogyo Kyokai-Shi, 95 (1987) 135.Google Scholar