No CrossRef data available.
Article contents
Spontaneous Self-Embedding of Three-Dimensional SiGe Islands
Published online by Cambridge University Press: 10 February 2011
Abstract
It is shown that. under appropriate conditions, high-Ge-concentration coherent 3D SiGe islands grown on Si(100) self-embed in a matrix of low-Ge-concentration alloy. The process may be more generally useful for preserving the shape of self-assembled “quantum dot” islands during embedding in a matrix material.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 2000
References
REFERENCES
1.
Tersoff, J., Teichert, C., and Lagally, M. G., Phys. Rev. Lett.
76, 1675 (1996); C. Teichert, M. G. Lagally, L. J. Peticolas, J. C. Bean, and J. Tersoff, Phys. Rev. B 53, 16334 (1996).10.1103/PhysRevLett.76.1675Google Scholar
2.
Bimberg, D., Grundmann, M., and Ledentsov, N. N., MRS Bulletin
23, 31 (1998) and references therein.10.1557/S0883769400031249Google Scholar
3.
Xie, Q., Madhukar, A., Chen, P., and Kobayashi, N. P., Phys. Rev. Lett.
75, 2542 (1995).10.1103/PhysRevLett.75.2542Google Scholar
4.
Rahmati, B., Jaeger, W., Trinkaus, H., Loo, R., Vescan, L., and Lüth, H., Appl. Phys. A
62, 575 (1996).10.1007/BF01571696Google Scholar
5.
Darhuber, A. A., Schittenhelm, P., Holy, V., Stangl, J., Bauer, G., and Abstreiter, G., Phys. Rev. B
55, 15652 (1997); P. Schittenhelm, G. Abstreiter, A. Darhuber, G. Bauer, P. Werner, and A. Kosogov, Thin Solid Films 294, 291 (1997).10.1103/PhysRevB.55.15652Google Scholar
6.
Mateeva, E., Sutter, P., Bean, J. C., and Lagally, M. G., Appl. Phys. Lett.
71, 3233 (1997).10.1063/1.120300Google Scholar
8.
Sutter, P., Mateeva, E., and Lagally, M. G., J. Vac. Sci. Technol. B
16, 1560 (1998).10.1116/1.589939Google Scholar
9.
Sutter, P. and Lagally, M. G., Phys. Rev. Lett.
81, 3471 (1998).10.1103/PhysRevLett.81.3471Google Scholar
10.
Sutter, P., Mateeva, E., Sullivan, J. S., and Lagally, M. G., Thin Solid Films
336, 262 (1999).10.1016/S0040-6090(98)01308-XGoogle Scholar
11.
Mo, Y.-W., Savage, D. E., Schwartzentruber, B. S., and Lagally, M. G., Phys. Rev. Lett.
65, 1020 (1990).10.1103/PhysRevLett.65.1020Google Scholar
12.
Ross, F. M., Tersoff, J., and Tromp, R. M., Phys. Rev. Lett.
80, 984 (1998).10.1103/PhysRevLett.80.984Google Scholar
13.
Medeiros-Ribeiro, G., Bratkovski, A. M., Kamins, T. I., Ohlberg, D. A. A., and Williams, R. S., Science
279, 353 (1998).10.1126/science.279.5349.353Google Scholar
14. Because the XTEM images are [110] cuts through the island, the observed base length corresponds to the diagonal of their <100> aligned bases. The corresponding facet angles are 8° and 17°.+aligned+bases.+The+corresponding+facet+angles+are+8°+and+17°.>Google Scholar
15. Insofar as mass-thickness contrast is mainly responsible for image formation in bright-field imaging, the regions of darker contrast correspond to SiGe alloy with higher Ge concentration.Google Scholar
16.
Sunamura, H., Usami, N., Shiraki, Y., and Fukatsu, S., Appl. Phys. Lett.
66, 3024 (1995); P. Schittenhelm, M. Gail, J. Brunner, J. F. Nuetzel, and G. Abstreiter, Appl. Phys. Lett. 67, 1292 (1995); H. Sunamura, Y. Shiraki, and S. Fukatsu, Appl. Phys. Lett. 66, 953 (1995); R. Apetz, L. Vescan, A. Hartmann, C. Dieker, and H. Uith, Appl. Phys. Lett. 66, 445 (1995).10.1063/1.114265Google Scholar
18.
Kishimoto, Y., Shiraki, Y., and Fukatsu, S., Appl. Phys. Lett.
70, 2837 (1997).10.1063/1.119019Google Scholar